Effect of Thickness on Structural and Morphological Properties of AlN Films Prepared Using Single Ion Beam Sputtering

effect of thickness on structural and morphological properties of aln films prepared using single ion beam sputtering

architecture and engineering of nanoscale sculptured thin films and determination of their properties

چکیده ندارد.

Effects of Annealing and Thickness on the Structural and Optical Properties of Crystalline ZnS Thin Films Prepared by PVD Method

Zinc Sulfide (ZnS) thin films were deposited on glass substrates at the pressure of 10-6 mbar by thermal resistor evaporation technique. The effects of annealing on the structural, optical properties of ZnS films were studied. Crystalline ZnS films have been analyzed by X-ray diffraction. Only cubic phase with the preferred (111) plane was found in ZnS films. Optical characteristics were studie...

The effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films

In this paper, the RF power change effect on the structural, optical and electrical properties of CuO thin films prepared by RF reactive magnetron sputtering deposited on glass substrates are studied. At first, the thin films are prepared at 150, 280, 310 and 340W respectively. Then, the films are characterized by XRD, AFM, Uv-visible and four-point probe analysis respectively. The results show...

Effect of Thickness on Properties of Copper Thin Films Growth on Glass by DC Planar Magnetron Sputtering

Copper thin films with nano-scale structure have numerous applications in modern technology.  In this work, Cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by DC magnetron sputtering technique at room temperature in pure Ar gas. The sputtering time was considered in 4, 8, 12 and 16 min, respectively. The thickness effect on the structural, mo...

Effect of Thickness on the Structural Properties of Tellurium Film Prepared by Thermal Evaporation

In this research, tellurium (Te) film with thicknesses of 100-250 nm were deposited on ceramic substrates by thermal evaporation at 373 K. The thickness of the film was determined by Rutherford backscattering spectroscopy. The influence of the thickness on the structural, morphological and molecular bonds was characterized using XRD, scanning electron microscope, and Raman spectroscopy. The XRD...