Uniform period sub-micron gratings have been fabricated using focused ion beam milling on hafnium oxide waveguides. Atomic force microscopy indicates that the gratings have smooth and uniform profiles. At the period of 330 nm, the largest peak-to-peak height that was achieved was 85 nm. Scattering at the grating imperfections was found to be at least two orders of magnitude weaker than the inte...

Patterning with a focused ion beam (FIB) is an extremely versatile fabrication process that can be used to create microscale and nanoscale designs on the surface of practically any solid sample material. Based on the type of ion-sample interaction utilized, FIBbasedmanufacturing can be both subtractive and additive, even in the same processing step. Indeed, the capability of easily creating thr...

1. New products, new needs for investigation New electronic devices have to integrate more and more features and the current trend is focused on the three-dimensional miniaturization of devices [1]. This evolution leads to the design of complex systems made of several chips embedded in newgeneration packages. Flip-chips and copper pillars, multi-MEMS-ICs systems and new sensors design are examp...

Focused ion beam (FIB) etching is receiving increasing attention for the fabrication of active integrated optical components such as waveguide amplifiers and lasers. Si-technology compatible low-loss Al2O3 channel waveguides grown on thermally oxidized silicon substrates have been reported recently. We used FIB milling for reflection grating definition on Al2O3 channel and ridge waveguides. Str...