نتایج جستجو برای: pulsed laser deposition
تعداد نتایج: 296469 فیلتر نتایج به سال:
Solid state thin film lithium microbatteries fabricated by pulsed-laser deposition (PLD) are suggested. During deposition the following process parameters must be considered, which are laser energy and fluence, laser pulse duration, laser pulse frequency, target composition, background gasses, substrate temperature, target-substrate distance and orientation. The effects of the variations of the...
Tantalum oxide is a compound with attractive properties and important applications in optoelectronis. It has a high refractive index and a good thermal and chemical stability. Tantalum oxide thin layers have been deposited by laser ablationpulsed laser deposition (PLD) and radiofrequency assisted pulsed laser ablation (RF-PLD) starting from a Tantalum metallic target in oxygen atmosphere. In th...
Since its introduction several decades ago, Pulsed Laser Deposition (PLD), has proved to be a powerful technique for synthesizing broad spectrum of functional thin films [...]
The use of ZnO template layers grown Pulsed Laser Deposition (PLD) has been seen to produce dramatic improvements in the surface morphology, crystallographic quality and optical properties of ZnO layers grown on c-sapphire substrates by Metal Organic Chemical Vapor Deposition. This paper provides complementary details on the PLD-grown ZnO template properties.
MoS2 thin films were grown by the pulsed laser deposition technique using a picosecond at wavelength of 1030 nm. The plasma ion mean kinetic energy and density estimated from time-of-flight distributions measured Langmuir planar probe. It has been found that decreases with increasing pulse energy. This unusual effect is explained difference in volatility vaporized species. Samples structurally ...
: Optimisation of femtosecond pulsed laser deposition parameters for the fabrication of silicon thin films is discussed. Substrate temperature, gas pressure and gas type are used to better understand the deposition process and optimise it for the fabrication of high-quality thin films designed for optical and optoelectronic applications.
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