نتایج جستجو برای: rf sputtering
تعداد نتایج: 40854 فیلتر نتایج به سال:
In this study, titanium thin films were deposited on alumina substrates by radio frequency (RF) magnetron sputtering. The mechanical properties of the Ti coatings were evaluated in terms of adhesion strength at various RF powers, temperatures, and substrate bias voltages. The coating conditions of 400W of RF power, 250°C, and a 75V substrate bias voltage produced the strongest coating adhesion,...
We report on our progress towards the integration of nonreciprocal optical elements in, for example, an integrated optical waveguide isolator on conventional semiconductor photonic platforms. Our approach uses an evanescent interaction with a magneto-optic iron garnet upper cladding. Specifically, ceriumand bismuthsubstituted yttrium and terbium iron garnets were investigated. Device fabricatio...
The influence of the ion–atom potential on sputtering parameters calculated with molecular dynamics simulations was last investigated in detail by Harrison in 1980 [J. Appl. Phys. 52 (1981) 1499]. Harrison concluded that except for total yields, layer yields, yields from different crystal orientations and atom per single ion (ASI) distributions, most sputtering properties were relatively insens...
Nanocrystalline films of La-doped CaB6 have been fabricated by using a rf-magnetron sputtering. Lattice expansion of up to 6% with respect to the bulk value was observed along the direction perpendicular to the film plane, which arises from the trapping of Ar gas into the film. Large ferromagnetic moment of 3 ∼ 4 μB/La has been observed in some La-doped films only when the lattice expansion rat...
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