Chemical vapour deposition enables the polymerisation of N -unsubstituted diketopyrrolopyrrole derivative into polymer thin film combining H-bonding and conjugated covalent bonds, increasing conductivity lifetime electronically excited states.

A new chemical vapour deposition (CVD) technique is presented. It is especially advantageous for the deposition of compound materials. The technique improves the uniformity and reproducibility of the deposition. The economical use of gaseous reactants is improved by a factor varying between 5 and 20. This is important in the case of expensive metal-organic CVD methods. The method consists in th...

Carbon Nanotubes have exceptional mechanical and electrical properties. Various methods have been thoroughly investigated for the growth of CNTs. The best and the most commonly used method is Chemical Vapour Deposition (CVD). The various techniques include Reaction Chamber heating, Plasma Enhanced CVD, Hot filament CVD, Microwave CVD. The structural uniformity of carbon nanotubes produced by pl...

A widely used application of the atomic layer deposition (ALD) and chemical vapour deposition (CVD) methods is the preparation of permeation barrier layers against water vapour. Especially in the field of organic electronics, these films are highly demanded as such devices are very sensitive to moisture and oxygen. In this work, multilayers of aluminium oxide (AlO x ) and plasma polymer (PP) we...