Thin alumina films, deposited at 280~ by low-pressure, metal-organic, chemical-vapor deposition on stainless steel, type AISI 304, were annealed at 0.17 kPa in a nitrogen atmosphere for 2, 4, and 17 hr at 600, 700, and 800~ The effect of the annealing process on the adhesion of the thin alumina films was studied using a scanning-scratch tester, type SST-IO1, developed by Shimadzu. The best mech...