Nano-porous silicon were simply prepared from p-type single crystalline silicon wafer by electrochemical etching technique via exerting constant current density in two different HF-Ethanol and HF-Ethanol-H2O solutions. The mesoporous silicon layers were characterized by field emission scanning electron microscopy and scanning electron microscopy. The results demonstrate that the width of nano-p...

ZnO nanostructure films were deposited by radio frequency (RF) magnetron sputtering on etched silicon (100) substrates using dry Ar/SF6 plasma, at two etching times of 5 min and 30 min, and on non etched silicon surface. Energy dispersive X-ray (EDX) technique was employed to investigate the elements contents for etched substrates as well as ZnO films, where it is found to be stoichiometric. Su...

Porous hollow glass microspheres have many uses, including encapsulation of active materials. In this paper a fast and facile method for fabricating porous hollow glass-microspheres was demonstrated by etching them using dilute hydrofluoric acid. Then, a highly reactive amine was infiltrated into the etched glass microspheres. Scanning electron microscopy was conducted for the hollow glass micr...

We report the nonselective plasma etching of epitaxial GaN:Mg, Al0.63Ga0.37N, and AlN/Al0.08Ga0.92N short-period superlattices with various doping properties. Etching is performed using mixed CF4/Ar feed gases in a combined inductively coupled plasma and reactive-ion etching chamber. A uniform etch rate of ,23 nm/min is obtained for each of the compositions studied under identical conditions. T...

We present a technique for obtaining atomic resolution ultrahigh vacuum scanning tunneling microscopy images of diamond (100) films, and use this technique to study the temperature dependence of the etching of epitaxial diamond (100) films by atomic hydrogen. We find that etching by atomic hydrogen is highly temperature dependent, resulting in a rough and pitted surface at T approximately 200 a...

Uniform cubooctahedral nanoparticles of Pd were synthesized using a modified polyol process. Like the silver system, the Pd nanoparticles underwent dissolution due to oxidative etching by Cl-/O2. In the early stage of etching, the twinned particles in a sample were selectively removed to leave behind uniform, single-crystal cubooctahedra. If the etching was allowed to continue, the single-cryst...

We investigated the aluminum nitride etching process for MEMS resonators. The process is based on Cl2/BCl3/Ar gas chemistry in inductively coupled plasma system. The hard mask of SiO2 is used. The etching rate, selectivity, sidewall angle, bottom surface roughness and microtrench are studied as a function of the gas flow rate, bias power and chamber pressure. The relations among those parameter...

INTRODUCTION The adhesive systems and the techniques currently used are designed to provide a more effective adhesion with reduction of the protocol application. The objective of this study was to evaluate the bond strength of universal adhesive systems on enamel in different etching modes (self-etch and total etch). MATERIALS AND METHODS The mesial and distal halves of 52 bovine incisors, he...