Quantized magnetic disks consisting of an array of single domain Ni pillars with a density of 18 Gbits/in. were fabricated using nanoimprint lithography ~NIL! and electroplating. The total disk area, limited by the NIL mold, is 4 cm34 cm, leading to a total 45 Gbits. Magnetic force microscope ~MFM! images show that all pillars 70 nm in diameter and 400 nm in height are single domain. The magnet...

We have used the force exerted on a neutral atom by an optical standing wave to focus a neutral atomic beam into a grating structure that is deposited on a substrate. We have made gratings with pitch of 294 nm, linewidths of d540–45 nm and contrast .10:1, over an area of 7.6 mm. We discuss the conditions needed to make the narrowest structures, and how these conditions affect the performance of...

A chip-size vertically aligned nanowire (NW) resonator arrays (VNRs) device has been fabricated with simple one-step lithography process by using grown self-assembled zinc oxide (ZnO) NW arrays. VNR has cantilever diameter of 50 nm, which breakthroughs smallest resonator record (>100 nm) functioning in atmosphere. A new atomic displacement sensing method by using atomic force microscopy is deve...

In situ and real time control of the different process steps in semiconductor device manufacturing becomes a critical challenge, especially for the lithography and plasma etching processes. Real time scatterometry is among the few solutions able to meet the requirement for in line monitoring. In this paper we demonstrate that real time scatterometry can be used as a real time monitoring techniq...

In this work, antiwear nanoimprint templates were made by depositing and patterning diamondlike carbon DLC films on Si and quartz. A capacitively coupled plasma enhanced chemical vapor deposition PECVD system was configured to deposit 100 nm–1 m thick DLC films on Si and quartz substrates. These films were characterized with Raman spectroscopy, electron energy loss spectroscopy, atomic force mi...

We have determined the mechanical anisotropy of a single microtubule by simultaneously measuring the Young's and the shear moduli in vitro. This was achieved by elastically deforming the microtubule deposited on a substrate tailored by electron-beam lithography with a tip of an atomic force microscope. The shear modulus is 2 orders of magnitude lower than the Young's, giving rise to a length-de...

The authors have developed a technique that couples nanolithographic patterning using an atomic force microscope with the parallel patterning abilities of soft lithography. Master pattern generation is accomplished using local anodic oxidation as a mask pattern for anisotropic wet etching of Si 110 . The resulting nanostructures are then used as master patterns for the molding of polymeric stam...

Piezoresponse force microscopy (PFM) is a powerful method widely used for nanoscale studies of the electromechanical coupling effect in various materials systems. Here, we review recent progress in this field that demonstrates great potential of PFM for the investigation of static and dynamic properties of ferroelectric domains, nanofabrication and lithography, local functional control, and str...

Engineering complex extracellular matrix (ECM) is an important challenge for cell and tissue engineering applications as well as for understanding fundamental cell biology. We developed the methodology for fabrication of precisely controllable multiscale hierarchical structures using capillary force lithography in combination with original wrinkling technique for the generation of well-defined ...

Nanocontact printing using hydrogen silsesquioxane (HSQ) soft stamps is studied for nanobio device fabrications in this work. The stamps with designed linewidth 80-200 nm were fabricated by low-dose e-beam lithography on HSQ films. The contact printing technique by using aminosilane as the ink on O2 plasma treated HSQ/Si substrates was developed. The plasma treatment, stamping force and stampin...