Graphene grown on silicon carbide by high-temperature annealing (SiC/G) is a strong contender in the race towards large-scale graphene electronics applications. The unique electronic properties of this system lead to a remarkably robust and accurate Hall resistance quantisation of 0.1 parts per billion, making SiC/G devices highly desirable for the endeavour of quantum resistance metrology. How...

The report summarizes the Consultative Committee for Mass (CCM) key comparison CCM.P-K4.2012 for absolute pressure spanning the range of 1 Pa to 10 000 Pa. The comparison was carried out at six National Metrology Institutes (NMIs), including National Institute of Standards and Technology (NIST), Physikalisch-Technische Bundesanstalt (PTB), Czech Metrology Institute (CMI), National Metrology Ins...

While metrology has a long tradition of use in physics and chemistry, it is rarely referred to in the software engineering measurement, and in particular, in the design and documentation of software measures. Using the ISO 9126-4 Technical Report on the measurement of software quality in use as a case study, this paper reports on the extent to which this ISO series addresses the metrology crite...

Three-dimensional integrated circuits (3D ICs) introduce wafer bonding and Through Silicon Vias (TSVs) as new modules, thus extending manufacturing requirements beyond CMOS. A 3D IC with a photosensor is taken as an example to further analyze the resulting new metrology requirements for mass production. For the wafer bond module, data on defects before and after bonding, bond interface adhesion...

Since 2020 a large consortium has been engaged in the project EMPIR 19ENV01 traceRadon to develop missing traceability chains improve sensor networks climate observation and radiation protection. This paper presents results areas of: Novel 226Ra standard sources with continuous controlled 222Rn emanation rate, radon chambers aimed create reference atmosphere field for flux monitoring. The major...

This paper reports on the recent work carried out as part of the EU funded NanoMend project. The project seeks to develop integrated process inspection, cleaning, repair and control systems for nanoscale thin films on large area substrates. As the PV – photovoltaic industry turns its attention on increasing efficiency and functional lifespan, the need for improved, high resolution and high spee...

Modern industry needs quick and reliable measurement methods for measuring deformation, position, shape, roughness, etc. This thesis is mainly concerned with industrial applications of speckle metrology. Speckle metrology is an optical non-contact whole field technique that provides the means to measure; deformation and displacement, object shape, surface roughness, vibration, and dynamic event...

We report on advances in ac voltage metrology made possible by a new generation of Multijunction Thermal Converters (MJTCs). Although intended for use primarily in highfrequency (1 MHz to 100 MHz) metrology, their exceptional low-frequency qualities, combined with a large dynamic range, makes these MJTCs excellent devices for the frequency range 10 Hz to 100 MHz at voltages from 1 V to 20 V, de...

We describe nonlinear quantum atom–light interfaces and nonlinear quantum metrology in the collective continuous variable formalism. We develop a nonlinear effective Hamiltonian in terms of spin and polarization collective variables and show that model Hamiltonians of interest for nonlinear quantum metrology can be produced in 87Rb ensembles. With these Hamiltonians, metrologically relevant ato...

In a previous paper, the University of Arizona (UA) has developed a measurement technique called: Software Configurable Optical Test System (SCOTS) based on the principle of reflection deflectometry. In this paper, we present results of this very efficient optical metrology method applied to the metrology of X-ray mirrors. We used this technique to measure surface slope errors with precision an...