Silicon nitride and silicon nitride-based ceramics have several favorable material properties, such as high hardness and good wear resistance, which makes them important materials for the coating industry. This thesis focuses the synthesis of silicon nitride, silicon oxynitride, and silicon carbonitride thin films by reactive magnetron sputtering. The films were characterized based on their che...

In this study, titanium thin films were deposited on alumina substrates by radio frequency (RF) magnetron sputtering. The mechanical properties of the Ti coatings were evaluated in terms of adhesion strength at various RF powers, temperatures, and substrate bias voltages. The coating conditions of 400W of RF power, 250°C, and a 75V substrate bias voltage produced the strongest coating adhesion,...

Calcium phosphate coatings are widely used to increase the biocompatibility of metal implants. Nowadays various dopants in structure calcium actively studied. Nitric oxygen is known as an essential mediator blood flow. Its presence coating can stimulate angiogenesis and promote osseointegration implant. This article dedicated study morphology physico-chemical properties formed via reactive RF-$...

Thin films of ZnWO4, a promising photocatalytic and scintillator material, were deposited for the first time using reactive dual magnetron sputtering procedure. A ZnO target was operated an RF signal, W DC signal. The power on changed so that it would match rate at 25 W. effects process parameters characterized optical spectroscopy, X-ray diffraction, scanning electron microscopy, including ene...

Techniques for cost-efficient operation of SiNx:H systems with a capability for hydrogen passivation in a manufacturing environment are analyzed. We conclude that SiNx:H performance may be optimized by a variety of techniques, and that the cost and productivity of the deposition tool may be the determining factors in the industry’s decision for a particular technique. PECVD constitutes the curr...

Aluminium doped zinc oxide thin films (4 at.% Al) were deposited by reactive magnetron sputtering technique and characterized by X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), four point probe technique and optical spectrophotometry. High heterogeneities were observed as a function of sample position in the chamber. The chemical analyses did not reveal significant change...