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Highly oriented soft underlayers with face-centered-cubic ~fcc! phase Co, Co alloy, and composite NiFe/Co film structures have been epitaxially grown on single crystal Si wafers by sputter deposition. The epitaxial orientation relationships have been determined by x-ray diffraction and transmission electron microscopy. It was found that the soft underlayer magnetic properties can be modified in...

We present a strategy of stress reduction in sputter deposited films by a nano-compliant layer at the substrate using physically self-assembled nanostructures obtained at high working-gas pressures prior to the deposition of a continuous film. This technique is all in situ, and the nanostructures are made of the same material as the deposited thin film and requires no lithography process. This ...

Highly oriented NiFe thin films have been produced via sputter deposition on HF etched Si substrates. Cu and Ag are used as underlayers to induce the epitaxial growth of NiFe films. The orientation relationships between NiFe, Cu, Ag, and Si have been determined by x-ray diffraction measurements and transmission electron microscopy. Magnetic properties have also been characterized. © 1999 Americ...

Pyroelectric PbTiO3 thin films devices with two temperature compensating elements on a SiO2/Si3N4 membranes have been fabricated and characterized. The measured voltage responsivity as a function of radiation modulation frequency has been compared to finite element model calculation. The relevant film properties have been compared for sputter and a sol-gel deposition techniques. The calculated ...

Microscopy and diffraction measurements are presented of ultrathin binary alloy films ruthenium molybdenum that obtained by standard sputter deposition . For compositions close to Ru 50 Mo , we find the be amorphous. The amorphicity is accompanied a significant reduction roughness with respect equally thick either or molybdenum. We ascribe this absence grain structure characteristic polycrystal...