A review is presented of wide-angle, low-light-level imaging observations of the Moon’s extended sodium atmosphere and Monte Carlo simulation studies used in their interpretation. The observational results at quarter and fulI Moon show dramatically different morphology patterns. The computer model results show that both morphologies are consistent with a single source function and subsequent dy...

A study has been initiated to investigate interactions between low-energy xenon ions and molybdenum using molecular dynamics (MD) simulation. An MD code, Simulation Kit, designed for simulation of atomic collisions in solid lattices was used in this study. The ion energies ranged from 150 to 500 eV. The ions impinged on the target normal to the (110) plane. The target consisted of 6 layers, eac...

Size-selected Pd nanoclusters in the size range from 887 to 10,000 atoms were synthesized in a magnetron sputtering, inert gas condensation cluster beam source equipped with a time of flight mass filter. Their morphologies were investigated using scanning transmission electron microscopy (STEM) and shown to be strongly size-dependent. The larger clusters exhibited elongated structures, which we...

Plasma sputtering deposition of Platinum thin films is studied on porous anodic aluminum oxide (AAO) template. The size effect of AAO cylindrical pores is shown to influence the diffusion of atoms in the porous layer. The resulting maximum reached depth of platinum varied from 2 μm to 20 μm, and the density on the surface is lowered from 23 μg.cm to 5 μg.cm as the pore diameter increased from 4...

Sputtering yields of molybdenum (Mo) are computed for deuterium, oxygen and carbon as impurity ions from the residual gas vacuum system, well Mo Cs using Yamamura formula. The incident ion energy ranges 10 keV to 1 MeV, back-streaming beam extraction voltage up ITER full acceleration potential. sputtering yield against reached ten atoms per was largest among investigated species. effect due ret...

The condensation of energetic metal ions on a surface may cause self-sputtering even in the absence of substrate bias. Charge-stateaveraged self-sputtering yields were determined for both zirconium and gold ions generated by a cathodic vacuum arc. Films were deposited on differently biased substrates exposed to streaming Zr and Au vacuum arc plasma. The self-sputtering yields for both metals we...

In this work, an integrated multiscale simulation of magnetron sputtering epitaxy was conducted to study the effect pressure on surface micro-topography sputtered Cu/Si films. Simulation results indicated that, as increased from 0.15 2 Pa, peak energy incident distribution gradually decreased 0.2 eV, which might be mainly due gradual decrease in proportion deposited Cu atoms whose ranged 30 eV;...

We present a new and simple laser-based process to porosify thin film silicon using a pulsed laser. During deposition, we incorporate gas atoms or molecules into the Si thin film. Pulsed laser radiation of wavelength λ = 532 nm heats up thin film Si beyond its melting point. Upon heating, gas atoms or molecules form nm-sized thermally expanding gas bubbles in the silicon melt, until they explos...