This paper presents the findings from a qualitative study on the extent to which three dimensions of proximity–geographic, cognitive, and organizational– impact knowledge transfer and innovation post-M&A. Findings show that the elements of proximity substantially influence both knowledge transfer and innovation although the nature of the impact varies and is influenced by the type of management...

A survey was conducted In 1970 and 1971 of the communication patterns of 1,500 research and development scientists and engineers working in Ireland. The techniques used in studying individual firms were adapted to suit the conditions within the country. The findings of this survey indicate that if international transfer of technology is to be fostered, more attention should be paid to the devel...

This paper reviews the background and concepts relevant to understanding knowledge and technology transfer in the Internet2 project of UCAID. Drawing from presentations at the Knowledge and Technology Transfer Panel at the Internet2 Sociotechnical Summit, this paper suggests opportunities for research on technology transfer among UCAID collaborators working on new developments for advanced netw...

to empower the farmer villagers, execution of training programs including semi-presence training, open training and virtual training is essential. the main purpose of the present research is to determine the factors affecting the enabler trainings to farmer villagers with an emphasis on the component of culture and education technology using the interpretative structural modeling together with ...

The Image Understanding Environment (IUE) provides a large, robust, well-documented, C++ hierarchy and tool suite to support Image Understanding research and technology transfer. This paper describes the additions and improvements that have been made to the IUE since its rst public release at IUW'96.

Inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of ...

a Office of Research and Development, National Chiao Tung University, 1001 University Road, Hsinchu, Taiwan, ROC b Department of Biobusiness Management, National Chiayi University, 580 Shinmin Road, Chiayi, Taiwan, ROC c Institute of Industrial Economics, Jinan University, Guangzhou, China d Graduate Institute of Technology Management, National Chiao Tung University, 1001 University Road, Hsinc...

This paper analyzes the effects of a potential spillover on technology transfer of a multinational enterprise and on the host country policy. In particular, we examine how both parties’ incentives can be controlled through the ownership structure in an international joint venture. In contrast to existing arguments we show that spillovers must not always have negative effects on technology trans...

Level-set based inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem, interpreted with a time-dependent model, and then solved as a partial differential equation with finite difference schemes. This paper focuses on developing level-set based ILT for partially coherent systems, and upon that an expectation-orient optimization frame...