In this paper we present discretization and decomposition methods for a multi-component transport model of a chemical vapor deposition (CVD) process. CVD processes are used to manufacture deposition layers or bulk materials. In our transport model we simulate the deposition of thin layers. The microscopic model is based on the heavy particles, which are derived by approximately solving a linear...

TING FUNG CHUNG∗,‡, TIAN SHEN∗, HELIN CAO∗,‡, LUIS A. JAUREGUI†,‡, WEI WU§, QINGKAI YU¶, DAVID NEWELL‖ and YONG P. CHEN∗,†,‡,∗∗ ∗Department of Physics, West Lafayette, Indiana 47907, USA †School of Electrical and Computer Engineering, West Lafayette, Indiana 47907, USA ‡Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, USA §Department of Electrical and Computer Engi...

We present a homogenization technique for rarefied gas flow over a microstructured surface consisting of patterns of periodic features. The length scale of the model domain is comparable to the mean free path of the molecules, while the scale of the surface patterns is much smaller. The flow is modeled by a system of linear Boltzmann equations with a diffusive boundary condition at the patterne...

Deposition rates, wet etch rates, and thickness uniformity experiments were performed using O3/TEOS thermal chemical-vapor deposition. Our results for oxide deposition show optimum process window around 200 Torr for producing films of good quality ~uniformity and material properties!. This is in excellent agreement with the modeling predictions over a broad range of pressure ~100–600 Torr! and ...

Characterization and Performance of LiFePO4 Thin-Film Cathodes Prepared with Radio-Frequency Magnetron-Sputter Deposition Jian Hong,* Chunsheng Wang,** Nancy J. Dudney,** and Michael J. Lance Department of Chemical Engineering, Tennessee Technological University, Cookeville, Tennessee 38505, USA Department of Chemical and Biochemical Engineering, University of Maryland, College Park, Maryland 2...

(I) CHROMATOGRAPHIC METHODS FOR SOLUTE DESCRIPTORDETERMINATIONS(II) RUTHENIUM SUBSTRATE-CATALYZED GROWTH OF NICKEL NITRIDETHIN FILMS BY ATOMIC LAYER DEPOSITION