نتایج جستجو برای: chemical vapour deposition

تعداد نتایج: 460703  

2013
T. Sripriya

This paper is presented to give an overall view of pressure sensors in the previous two decades. The evolution of sensor technologies, different MEMS pressure sensors, their merits and demerits are discussed. Keywords— Fabry Perot Interferometer (F-P), Pressure Sensors, Electromagnetic Interference (EMI), Low pressure chemical vapour deposition (LPCVD).

2003
P. J. Gellings

Thin alumina films were deposited on stainless steel, type AISI 304. The deposition process was carried out in nitrogen with low partial pressures of water (0-2.6 x 10 -2 kPa (0-0.20 mmHg)) by metal-organic chemical vapour deposition (MOCVD) with aluminium-tri-sec-butoxide (ATSB) as the precursor. Also results are presented regarding the alumina deposition in the presence of small amounts of 2-...

Journal: :Chemical communications 2010
Xiao Li Chunyan Li Hongwei Zhu Kunlin Wang Jinquan Wei Xinming Li Eryang Xu Zhen Li Shu Luo Yu Lei Dehai Wu

A new form of hybrid carbon-based thin film was prepared via a pyridine chemical vapour deposition method. The as-obtained films consist of agglomerated flowerlike graphene nanowhiskers embedded in a uniform matrix of amorphous carbon. Schottky solar cells made from the hybrid films and n-type silicon show conversion efficiencies of approximately 1% under AM 1.5 illumination.

2006
A. Zubiaga J. A. García F. Plazaola F. Tuomisto K. Saarinen

Photoluminescence and positron annihilation spectroscopy have been used to characterize and identify vacancy-type defects produced in ZnO films grown on sapphire by metal-organic chemical-vapor deposition. The photoluminescence of the samples in the near band edge region has been studied, paying particular attention to the emission at 370.5 nm 3.346 eV . This emission has been correlated to the...

2009
D. J. Rogers F. Hosseini Teherani C. Sartel V. Sallet F. Jomard P. Galtier M. Razeghi

The use of ZnO template layers grown Pulsed Laser Deposition (PLD) has been seen to produce dramatic improvements in the surface morphology, crystallographic quality and optical properties of ZnO layers grown on c-sapphire substrates by Metal Organic Chemical Vapor Deposition. This paper provides complementary details on the PLD-grown ZnO template properties.

2007
Z. G. Hu A. B. Weerasekara N. Dietz A. G. U. Perera M. Strassburg M. H. Kane A. Asghar I. T. Ferguson

Z. G. Hu,1 A. B. Weerasekara,1 N. Dietz,1 A. G. U. Perera,1,* M. Strassburg,1,2 M. H. Kane,2,3 A. Asghar,2 and I. T. Ferguson2,3 1Department of Physics and Astronomy, Georgia State University, Atlanta, Georgia 30303, USA 2School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, USA 3School of Materials Science and Engineering, Georgia Institute of ...

2004
P. J. Gellings

Thin alumina films, deposited at 280~ by low-pressure, metal-organic, chemical-vapor deposition on stainless steel, type AISI 304, were annealed at 0.17 kPa in a nitrogen atmosphere for 2, 4, and 17 hr at 600, 700, and 800~ The effect of the annealing process on the adhesion of the thin alumina films was studied using a scanning-scratch tester, type SST-IO1, developed by Shimadzu. The best mech...

2003
C. Y. Liu Shu Yuan S. J. Chua M. C. Y. Chan S. Z. Wang

A GaInP/AlGaInP multiple quantum well laser structure was grown by low-pressure metalorganic chemical vapor deposition with tertiarybutylarsine and tertiarybutylphosphine. Laser diodes fabricated from this structure lased at room temperature. Photoluminescence ~PL! measurements were performed from 10 to 230 K. The PL energy increased with temperature from 10 to 70 K and decreased above 70 K. Th...

2009
S. Nicolay S. Fay C. Ballif

A growth model for the low pressure chemical vapor deposition (LPCVD) of polycrystalline ZnO thin films is proposed. This model is based on experimental observations of the surfacemorphology and crystallographic orientations of the layers at different thicknesses and growth temperatures. It is shown that the films preferred orientation evolves from c-axis to aaxis as the growth temperature is i...

2012
C. Bayram

A pulsed layer-by-layer deposition (PLLD) technique possessing triple growth rates compared to conventional growth techniques is developed by metal organic chemical vapor deposition to realize high-quality high-aluminum content ordered AlXGa(1 X)N (0.5<X). X-ray diffraction, photoluminescence, and transmission measurements are employed to demonstrate control over aluminum content, structural un...

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