The end of the 19 century brought about a change in the dynamics of computing by the development of the microprocessor. Huge bedroom size computers began being replaced by portable, smaller sized desktops. Today the world is dominated by silicon, which has circumscribed chip development for computers through microprocessors. Majority of the integrated circuits that are manufactured at present a...

Nanoimprint lithography ~NIL! is a paradigm-shift method that has shown sub-10-nm resolution, high throughput, and low cost. To make NIL a next-generation lithography tool to replace conventional lithography, one must demonstrate the needed overlay accuracy in multilayer NIL, large-area uniformity, and low defect density. Here, we present the fabrication of 60-nm channel metal–oxide–semiconduct...

OVERVIEW: The minimum feature size required for the most advanced semiconductor devices is now below half the exposure wavelength, and the optical lithography technology is facing its practical resolution limit. In this article, we review the current status of DFM and issues for further miniaturization. The role and requirements of metrology technology are also discussed. The layout design has ...

Microfabrication is actually a collection of technologies which are utilized in making microdevices. Some of them have very old origins, not connected to manufacturing, like lithography or etching. Electroplating is technique adapted to produce micrometre scale structures, as are various stamping and embossing techniques. Micro-Components are required in a range of new products such as medical ...

this article describes an accurate subpico flowmeter bifurcatedin to liquid and gas flowrates less than 1mol/s for both mems/nems and cryogenic technology applications. the mems/nems are described as either two gauges (instrument), or quartz fluctuating forks, even if the liquid or gas flows through an element, as well as cryogenic technology consisting of arrays of either parallel photonic cry...

For advanced CMOS processes, inverse lithography promises better patterning fidelity than conventional mask correction techniques due to a more complete exploration of the solution space. However, the success of inverse lithography relies highly on customized cost functions whose design and know-how have rarely been discussed. In this paper, we investigate the impacts of various objective funct...

Liquid immersion lithography (LIL) extends the resolution of optical lithography to meet industry demands into the next decade. Through the use of exposure media such as purified water (n of 1.44 at 193 nm), it is possible to reduce minimum pitches compared with traditional air/vacuum exposures media by a factor of as much as 44%—a full technology node. Beyond this simple observation, there is ...

Earlier we reported on a proof-of-concept maskless-lithography system that used an array of Fresnel zone plates to focus multiple beams of 442 nm light onto a substrate, and micromechanics for multiplexing light to the several zone plates, enabling patterns of arbitrary geometry, at 350 nm linewidth, to be written. We referred to the technique as zone-plate-array lithography ~ZPAL!. We also dem...