VIII. IX. X. XI. XII. Sign Conventions Aberration-Free Image Spherical Wavefront, Defocus, and Lateral Shift Angular, Transverse, and Longitudinal Aberration Seidel Aberrations A. Spherical Aberration B. Coma C. Astigmatism D. Field Curvature E. Distortion Zernike Polynomials Relationship between Zernike Polynomials and Third-Order Aberrations Peak-to-Valley and RMS Wavefront Aberration Strehl ...

The design and construction of a double-hexapole aberration corrector has made it possible to build the prototype of a spherical-aberration corrected transmission electron microscope dedicated to high-resolution imaging on the atomic scale. The corrected instrument, a Philips CM200 FEG ST, has an information limit of better than 0.13 nm, and the spherical aberration can be varied within wide li...

PURPOSE To investigate whether corneal wavefront aberrations vary with aging. METHODS One hundred two eyes of 102 normal subjects were evaluated with videokeratography. The data were decomposed using Taylor and Zernike polynomials to calculate the monochromatic aberrations of the cornea for both small (3-mm) and large (7-mm) pupils. RESULTS For a 3-mm pupil, the amount of total aberrations ...

purpose: to compare tecnis z9000 and akreos ao aspheric intraocular lenses (iols) in terms of spherical aberration and contrast sensitivity. methods: thirty-four eyes of 34 patients undergoing phacoemulsification cataract surgery were randomly assigned for implantation of tecnis or akreos ao iols. three months postoperatively, best-corrected visual acuity (bcva), spherical aberration (with 4 an...

The aberration of a multipole Wien filter for energy-filtered x-ray photoemission electron microscopy was analyzed and the optimized Fourier components of the electric and magnetic fields for the third-order aperture aberration corrections were obtained. It was found that the third-order aperture aberration correction requires 12 electrodes and magnetic poles.

The precision and work efficiency of the distributed repeat projection lithography machine (DSW) directly affect special requirements large-scale integrated circuit production process. In order to improve exposure imaging accuracy projection, paper proposes object image difference in-situ detection (AMF) technology based on particle swarm optimization. article analyzes basic principles this usi...