The present study elucidated the effect of the selective inducible nitric oxide synthase (iNOS) inhibitor N(6)-(1-iminoethyl)-L-lysine (L-NIL) on monosodium urate (MSU) crystal-induced inflammation and edema in mice feet. L-NIL (5 or 10 mg/kg/day) was administered intraperitoneally 4 h before injection of MSU (4 mg) into the soles of mice hindlimb feet. Twenty-four hours after MSU injection, fo...

introduction: ischemia/reperfusion (ir) injury involves a complex interrelated sequence of events. high levels of nitric oxide (no) are generated with inducible form of nitric oxide synthase (inos) leading to the renal ir injury and glutathione (gsh) depletion. the present study was designed to investigate the effect of l-nil (n6- (1-iminoethyl)-l- lysine.hydrochloride), a selective inhibitor o...

BACKGROUND Fusarium head blight (FHB), mainly caused by Fusarium graminearum, substantially reduces wheat grain yield and quality worldwide. Proteins play important roles in defense against the fungal infection. This study characterized differentially expressed proteins between near-isogenic lines (NILs) contrasting in alleles of Fhb1, a major FHB resistance gene in wheat, to identify proteins ...

One of the main predictions of principal-agent theory, the “informativeness principle”, is often violated in practice. We propose an explanation that emphasizes the role played by the change in the form of the optimal contract that follows an improvement in informativeness. We show that the overall gains from a less noisy performance measure emanate from two sources: the direct effect of a chan...

We study Farrell Nil-groups associated to a finite order automorphism of a ring R. We show that any such Farrell Nil-group is either trivial, or infinitely generated (as an abelian group). Building on this first result, we then show that any finite group that occurs in such a Farrell Nil-group occurs with infinite multiplicity. If the original finite group is a direct summand, then the countabl...

The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...