نتایج جستجو برای: oxide film

تعداد نتایج: 260004  

2015
Shipu Xu Fengqiang Sun Shumin Yang Zizhao Pan Jinfeng Long Fenglong Gu

A new graphene-based composite structure, monolayer-ordered macroporous film composed of a layer of orderly arranged macropores, was reported. As an example, SnO2-reduced graphite oxide monolayer-ordered macroporous film was fabricated on a ceramic tube substrate under the irradiation of ultra-violet light (UV), by taking the latex microsphere two-dimensional colloid crystal as a template. Grap...

2017
Junghwan Kim Takumi Sekiya Norihiko Miyokawa Naoto Watanabe Koji Kimoto Keisuke Ide Yoshitake Toda Shigenori Ueda Naoki Ohashi Hidenori Hiramatsu Hideo Hosono Toshio Kamiya

The variety of semiconductor materials has been extended in various directions, for example, to very wide bandgap materials such as oxide semiconductors as well as to amorphous semiconductors. Crystalline β-Ga2O3 is known as a transparent conducting oxide with an ultra-wide bandgap of ~ 4.9 eV, but amorphous (a-) Ga2Ox is just an electrical insulator because the combination of an ultra-wide ban...

2012
Hao Yu Carrick M. Eggleston Jiajun Chen Wenyong Wang Qilin Dai Jinke Tang

Optical waveguide lightmode spectroscopy (OWLS) is usually applied as a biosensor system to the sorption-desorption of proteins to waveguide surfaces. Here, we show that OWLS can be used to monitor the quality of oxide thin film materials and of coatings of pulsed laser deposition synthesized CdSe quantum dots (QDs) intended for solar energy applications. In addition to changes in data treatmen...

2013
Ioanna Andreou Heinz Amenitsch Vlassis Likodimos Polycarpos Falaras Petros G. Koutsoukos Epameinondas Leontidis

In this work, we prepared oriented mesoporous thin films of silica on various solid substrates using the pluronic block copolymer P123 as a template. We attempted to insert guest iron oxide (FexOy) nanoparticles into these films by two different methods: (a) by co-precipitation-where iron precursors are introduced in the synthesis sol before deposition of the silica film-and subsequent oxide pr...

In this work, a novel Silicon on Insulator (SOI) MOSFET is proposed and investigated. The drain and source electrode structures are optimized to enhance ON-current while global device temperature and hot carrier injection are decreased. In addition, to create an effective heat passage from channel to outside of the device, a silicon region has embedded in the buried oxide. In order to reduce th...

Journal: :Journal of Japan Institute of Light Metals 1955

2004
M. J. GRAHAM

This paper considers the application of surface-analytical techniques to characterize both thin (-2 nm) passive oxide films and thick (up to 1 pm) oxides formed on metals and alloys a t high temperature. Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), Mossbauer spectroscopy, X-ray absorption near edge spectroscopy (XANES), secondary ion mass spectrometry (SIMS) and el...

2008
Liang Wang Hongjoo Rhee Sergio D. Felicelli Adrian S. Sabau John T. Berry

Porosity is a major concern in the production of light metal parts. This work aims to identify some of the mechanisms of microporosity formation in magnesium alloy AZ91. Microstructure analysis was performed on several samples obtained from gravity-poured ingots in graphite plate molds. Temperature data during cooling was acquired with type K thermocouples at 60 Hz at three locations of each ca...

2014
Eithan Ritz Yui Lun Wu Jungmi Hong Daniel Andruczyk Tae S. Cho D. N. Ruzic

a r t i c l e i n f o Keywords: Aluminum doped zinc oxide Post-annealing Dielectric barrier discharge Indium–tin oxide DC magnetron X-ray photoelectron spectroscopy Aluminum-doped zinc oxide (AZO) is a material that can have high electrical conductivity while being highly transparent at the same time. It has been used in many applications such as displays, mobile devices and solar cells. Curren...

2012
Meng Zhang Wei Zhou Rongsheng Chen Jacob Ho Man Wong Hoi-Sing Kwok

High-performance and low-temperature-compatible solid phase crystallized polycrystalline silicon thin film transistors using thermal oxide buffered aluminum oxide (Al2O3) as gate dielectric are demonstrated. By growing a thermal oxide buffer layer using two-step annealing method, the interface quality is greatly improved, resulting in excellent device performance.

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