the steps taken in designing a loop reactor for bulk propylene polymerization are discussed. the roles played by several parameters like particle growth factor, catalyst activity and solid fraction on reactor volume at different operating conditions are investigated. at first, based on a fixed production capacity and specific rate of catalyst, reactor volume is determined. next, the length and ...

in this paper, a novel method of producing bi-metallic alloy nanoparticles at low temperatures using hydrogen bombardment of thin films, deposited on glass substrates, is introduced. optical and morphological characteristics of the nanoparticles were extensively studied for various conditions of plasma treatment, such as plasma power density, temperature, duration of hydrogen bombardment, thick...

Nanocrystalline graphite (NCG) layers represent a good alternative to graphene for the development of various applications, using large area, complementary metal-oxide semiconductor (CMOS) compatible technologies. A comprehensive analysis physical properties NCG layers—grown different time periods via plasma-enhanced chemical vapour deposition (PECVD)—was conducted. The correlation between meas...

Amorphous SiO(2) membranes were prepared via a 2-step plasma-enhanced CVD (PECVD) technique at room temperature on porous TiO(2)/Al(2)O(3) substrates. SiO(2) membranes showed molecular sieving properties with a high separation factor for He/N(2) and He/H(2), and high thermal stability, indicating the successful preparation of high-performance membranes at low temperatures.

In recent years, a number of advantages such as modification of nano-crystalline thin films, the ability for low-temperature deposition processes, the controlling of process, as well as high efficiency and repeatability of process, were offered using plasma deposition technique [1]. Silicon carbide (SiC) as a leading candidate for the replacement of Silicon (Si) for hightemperature and power el...

In recent years, a number of advantages such as modification of nano-crystalline thin films, the ability for low-temperature deposition processes, the controlling of process, as well as high efficiency and repeatability of process, were offered using plasma deposition technique [1]. Silicon carbide (SiC) as a leading candidate for the replacement of Silicon (Si) for hightemperature and power el...

Abstract Unprotected copper conductors are prone to oxidation and corrosion, especially when in contact with salt water or at high temperature. In this study, we compared commercially available coating graphene oxide plasma-enhanced chemical vapor deposition (PECVD) coated wires terms of antioxidation anticorrosion protection. Samples were subjected aging tests a spray chamber. Thereafter, both...