Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by ...

While gas discharges under atmospheric pressure occur as filamentary discharges, most studies on plasma polymerization, or plasma Chemical Vapour Deposition (CVD), were carried out in low-pressure (low temperature, non-equilibrium) plasma. However, it is reasonable to assume that the fundamentals of plasma polymerization found by low-pressure discharge apply to the gas phase in the filamentary ...

Two models to describe the phenomenon of corona discharge are presented: first is known as plasma model which with chemistry defines volumetric and surface reactions among charge carriers such electrons, positive, negative ions. This uses Poisson's equation a formulation space-charge density calculate electric field necessary solve species transport equations. Besides, only determines carriers....

The initial goal of this study was to determine the minimum anesthetic concentration (MAC) for isoflurane (ISO) and sevoflurane (SEVO) for the crested serpent eagle. Next, we compared the anesthetic effects of each on the physiological effects, hematocrit, plasma chemistry values and behavior in spontaneously breathing captive adult crested serpent eagles. Sixteen eagles were randomly allocated...

Abstract Low-temperature plasma-processing technologies are essential for material synthesis and device fabrication. Not only the utilization but also development of plasma-related products services requires an understanding multiscale hierarchies complex behaviors phenomena, including plasma generation in physics chemistry, transport energy mass through sheath region, morphology- geometry-depe...

Reactive ion etching with SiCl, and BCls of high quality GaN films grown by plasma enhanced molecular beam epitaxy is reported. Factors such as gas chemistry, flow rate, and microwave power affecting the etching rate are discussed. The etch rate has been found to be larger with BCls than with SiC14 plasma. An etch rate of 8.5 &s was obtained with the BCl, plasma for a plasma power of 200 W, pre...

A successful exploitation of thermal plasmas in the field of high temperature chemistry and material processing requires a fundamental understanding of the interaction between a plasma and matter in the condensed phase. In this paper some of the basic aspects involved in the heat exchange between a thermal plasma and solids or liquids are reviewed, with emphasis on recent experimental results o...

The surface chemistry of plasma fluorinated vertically aligned carbon nanotubes (vCNT) is correlated to the CF4 plasma chemical composition. The results obtained via FTIR and mass spectrometry are combined with the XPS and Raman analysis of the sample surface showing the dependence on different plasma parameters (power, time and distance from the plasma region) on the resulting fluorination. Ph...

The application of plasma-enhanced chemical vapour deposition (PECVD) in the production and modification of carbon nanotubes (CNTs) will be reviewed. The challenges of PECVD methods to grow CNTs include low temperature synthesis, ion bombardment effects and directional growth of CNT within the plasma sheath. New strategies have been developed for low temperature synthesis of single-walled CNTs ...

Introduction: Hemoglobin A1C (HbA1c) reflects patient’s glycemic status over the previous 3 months. Previous studies have reported that iron deficiency may elevate A1C concentrations, independent of glycemia. This study is aimed to analyze the effect of iron deficiency anemia on HbA1c levels in diabetic population having plasma glucose levels in control. Methods: Totally, 120 diabetic, iron-def...