نتایج جستجو برای: plasma deposition

تعداد نتایج: 439546  

Journal: :Proceedings of the Japan Academy, Series B 2014

2005
Masataka Hirose Seiichi Miyazaki

The early stages of thin film growth from the rf glow discharge of silane-based gas mixtures have been systematically studied by structural characterizations of the silicon based multilayers. The x-ray diffraction, its rocking curve and x-ray interference of hydrogenated amorphous silicon(a-Si:H, 10 % 200 A thick)/stoichiometric silicon nitride (a-SigNq:H, 25 % 250 A) multiple layers have been ...

Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

2014
Naoki KANEKO Akinori NAKAMURA Yukihiko WASHIMI Takashi KATO Takashi SAKURAI Yutaka ARAHATA Masahiko BUNDO Akinori TAKEDA Shumpei NIIDA Kengo ITO Kenji TOBA Koichi TANAKA Katsuhiko YANAGISAWA

Alzheimer's disease (AD) is the most common and devastating dementia. Simple and practical biomarkers for AD are urgently required for accurate diagnosis and to facilitate the development of disease-modifying interventions. The subjects for the study were selected on the basis of PiB amyloid imaging by PET. Forty PiB-positive (PiB+) individuals, including cognitively healthy controls (HC), and ...

1999
A. Neuman J. Blum N. Tymiak Z. Wong N. P. Rao W. Gerberich P. H. McMurry J. V. R. Heberlein S. L. Girshick

A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructu...

2004
A. Buchel

A study of the i-layer porosity as a function of the deposition parameters by PECVD technique, is presented here. It is demonstrated in particular, that for a fixed deposition rate of 2 Ays, increasing the plasma power tends to increase the layer ̊ density, while increasing the pressure tends to increase the layer porosity. Regarding the cells, no correlation between the layer density and the in...

2005
H. Kersten G. Thieme M. Fröhlich D. Bojic D. H. Tung M. Quaas H. Wulff R. Hippler

Low-pressure plasmas offer a unique possibility of confinement, control, and fine tailoring of particle properties. Hence, dusty plasmas have grown into a vast field, and new applications of plasma-processed dust particles are emerging. During the deposition of thin amorphous films onto melamine formaldehyde (MF) microparticles in a C2H2 plasma, the generation of nanosized carbon particles was ...

2016
S. Alexandrov A. Kovalgin

The relatively new technique of remote plasma enhanced

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