This paper describes a one-dimensional model of excimer laser-annealing of amorphous silicon layers which are irradiated with a pulsed KrF excimer laser. For realisation of the model in COMSOL Multiphysics, the application mode heat transfer in solids is used. The model predicts a melt threshold for the energy density of the laser of Eth = 88.5 mJ/cm. It also predicts a linear increase of the m...

The effect of the crystallization and activated annealing of Si films using an excimer laser and the new CW blue laser are described and compared with furnace annealing for application in advanced TFTs and for future applications. Pulsed excimer laser annealing (ELA) is currently being used extensively as a low-temperature poly-silicon (LTPS) process on glass substrates as its efficiency is hig...

Laser technology is used in many basic and clinical disciplines and specialties, and it has played an important role in promoting the development of ophthalmology, especially corneal refractive surgery. We provide an overview of the evolution of laser technology for use in refractive and other ophthalmologic surgeries, mainly focusing on two types of lasers and their applications. First, we dis...

Excimer lasers are proving to be highly successful for fabricating industrial components with feature sizes in the range between 0.05–1,000μm (see Fig. 1). As well as providing a 15 year, 5 generation extension to optical lithography as used in the manufacture of silicon chips, excimer lasers are used for microfabricating many of the critical features in a wide variety of the electronic and tel...