BACKGROUND AND AIMS Polishing may increase the surface roughness of composites, with a possible effect on bacterial growth and material properties. This preliminary in vitro study evaluates the effect of three different polishing systems (PoGo polishers, Enhance, Venus Supra) on six direct resin composites (Gradia Direct, Venus, Venus Diamond, Enamel Plus HFO, Tetric Evoceram, Filtek Supreme XT...

Abstract Electrofuels, fuels produced from electricity, water, and carbon or nitrogen, are of interest as substitutes for fossil in all energy chemical sectors. This paper focuses on electrofuels transportation, where some can be used existing vehicle/vessel/aircraft fleets fueling infrastructure. The aim this study is to review publications summarize costs environmental performance. A special ...

Objective To evaluate the effect of aging in a hard denture reline (New Truliner) and an acrylic resin (Classic) after chemical and mechanical polishing. Methods Eighty specimens were made, divided randomly between 8 groups: G1.Acrylic Resin Classic (RAC)/Mechanical Polishing (PM); G2.RAC/PM + thermocycling (TR); G3) RAC/Chemical Polishing (PQ); G4.RAC/PQ + TR; G5.New Truliner (NT)/PM; G6.NT/PM...

Introduction The Chemical Mechanical Planarization (CMP) process plays a key role in the manufacture of data storage, video display panels, and semiconductor chips. The process combines the chemical (acidic or basic) effect of the slurry, which contains micro-abrasives with the mechanical effect provided by polishing to reduce the topography on the wafer or rigid disk substrate. The process for...

This study aimed to investigate the surface roughness and gloss of composite resins after using two polishing systems and toothbrushing. Six composite resins (Durafill VS, Filtek Z250, Filtek Z350 XT, Kalore, Venus Diamond, and Venus Pearl) were evaluated after polishing with two polishing systems (Sof-Lex, Venus Supra) and after toothbrushing up to 40,000 cycles. Surface roughness (Ra) and glo...

Axiomatic Design was used to develop a complete platform for chemical mechanical polishing (CMP) of silicon wafers. A functional requirement of the machine emerging from the axiomatic design process is the control of the wafer-scale polishing uniformity. Mechanisms to maintain control of the uniformity were designed, and integrated into a wafer carrier, which holds the wafer during polishing an...

The future X-ray observatory missions require grazing-incidence x-ray optics with angular resolution of < 5 arcsec halfpower diameter. The achievable resolution depends ultimately on the quality of polished mandrels from which the shells are replicated. With an aim to fabricate better shells, and reduce the cost/time of mandrel production, a computercontrolled polishing machine is developed for...

Optical surfaces can be accurately figured by computer controlled optical surfacing (CCOS) that uses well characterized sub-diameter polishing tools driven by numerically controlled (NC) machines. The motion of the polishing tool is optimized to vary the dwell time of the polisher on the workpiece according to the desired removal and the calibrated tool influence function (TIF). Operating CCOS ...