As a vital optical element working in the extreme ultraviolet (EUV) region, damage mechanism on Mo/Si multilayer has caught great attention. In this paper, using nanosecond table-top EUV source, an S-on-1 experiment was performed mirror with shot numbers S = 1, 2, 5, and 10. It demonstrated that multi-shot thresholds follow inverse-power-law as function of pulse number. The incubation effect is...