نتایج جستجو برای: nano metrology

تعداد نتایج: 55232  

2011
Vittorio Giovannetti Lorenzo Maccone

In classical estimation theory, the central limit theorem implies that the statistical error in a measurement outcome can be reduced by an amount proportional to n by repeating the measures n times and then averaging. Using quantum effects, such as entanglement, it is often possible to do better, decreasing the error by an amount proportional to n. Quantum metrology is the study of those quantu...

2008
Eric R. Marsh David A. Arneson Donald L. Martin

This paper demonstrates the application of two methods of separating spindle error motion from artifact roundness on a spindle with less than five nanometers radial error. Two error separation methods, reversal and multiprobe, were each applied to data taken on two different test stands allowing direct comparison of the four combinations of hardware and separation algorithm. Because the theory ...

2015
Leigh Fleming Liam Blunt David Robbins Mohamed Elrawemi

Fleming, Leigh, Blunt, Liam, Robbins, David and Elrawemi, Mohamed (2013) Characterisation techniques to assess functional properties of barrier coatings for flexible PV substrates. In: Proceedings of Laser Metrology and Performance X 10th International Conference and Exhibition on Laser Metrology, Machine Tool, CMM & Robotic Performance. LAMDAMAP 2013 . EUSPEN, Buckinghamshire, UK, pp. 59-69. I...

2002
Y. Xu G. W. Rubloff

Real-time, in situ chemical sensing has been applied to achieve reaction metrology and advanced process control in a low pressure tungsten chemical vapor deposition process based on WF6 and SiH4 reactants ~silane reduction process!. Using mass spectrometry as the sensor to detect both product generation (H2) and reactant depletion (SiH4) at wafer temperature of 200–250 °C, these signals provide...

1997
Artur Fuhrmann

In this paper we study the problem of computing the smallest-width annulus for a convex polytope in R d. This generalizes a topic from tolerancing metrology to higher dimensions, of which the planar case has been investigated by Swanson, Lee and Wu. We show this problem to be equivalent to the problem of computing diierent variants of Hausdorr-minimal spheres. We can formulate the latter proble...

2013
Alfredo Luis Alfonso Rodil

We examine a family of intrinsic performance measures in terms of probability distributions that generalize Hellinger distance and Fisher information. They are applied to quantum metrology to assess the uncertainty in the detection of minute changes of physical quantities. We show that different measures lead to contradictory conclusions, including the possibility of arbitrarily small uncertain...

Journal: :CoRR 2010
Fahad Al-Zahrani

The use of World Web Wide for distance education has received increasing attention over the past decades. The real challenge of adapting this technology for engineering education and training is to facilitate the laboratory experiments via Internet. In the sciences, measurement plays an important role. The accuracy of the measurement, as well as the units, help scientists to better understand p...

Journal: :CoRR 2011
P. I. Neyezhmakov S. I. Zub S. S. Zub

P.I.Neyezhmakov – PhD, 1 Deputy General Director on scientific work of National Scientific Center “Institute of Metrology”( Kharkiv, Ukraine), Head of COOMET Secretariat (Euro-Asian cooperation of national metrological institutions) S.I.Zub – senior scientist of NSC “Institute of Metrology”, Kharkiv, Ukraine S.S.Zub – PhD, doctoral candidate of Taras Shevchenko National University of Kyiv, Ukraine

1996
Costas Spanos

Novel metrology has been developed for measuring in-situ film thickness and absorption coefficient simultaneously. Designed specifically for photolithography processes, this metrology, if applied to photoresist films, can measure thickness and photoactive compound concentration in-situ, which are important parameters for photolithography process control and diagnosis.

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