We describe a convenient lithographic technique that can produce simple, repetitive micropatterns over large areas (several square centimeters). The technique uses an illuminated array of micrometer-scale lenses to generate an array of optical patterns in an image plane located within micrometer distances from the lens array. A layer of photoresist, placed in the image plane, records the patter...

The superinductor, the lumped-element LC resonator, and the microstrip feedline line were fabricated within the same vacuum cycle using multi-angle electron-beam deposition of Al films through a nanoscale lift-off mask. To minimize the spread of the junction parameters, we have used the so-called“Manhattan-pattern”bi-layer liftoff mask formed by a 400-nm-thick e-beam resist (the top layer) and ...

The direct pyrolytic carbonisation of polymer patterns has attracted interest for its use in obtaining carbon materials. In the case of carbonisation of nanopatterned polymers, the polymer flow and subsequent pattern change may occur in order to relieve their high surface energies. Here, we demonstrated that liquid immersion thermal crosslinking of polymer nanopatterns effectively enhanced the ...

Cryogenic etching of silicon, using an inductively coupled plasma reactive ion etcher ICP-RIE , has extraordinary properties which can lead to unique structures difficult to achieve using other etching methods. In this work, the authors demonstrate the application of ICP-RIE techniques which capitalize on the cryogenic properties to create different sensors geometries: optical, electrical, magn...

Over the past decade, a major effort was made to miniaturize engineered tissues, as to further improve the throughput of such approach. Most existing methods for generating microtissues thus rely on T-shaped cantilevers made by soft lithography and based on the use of negative SU-8 photoresist. However, photopatterning T-shaped microstructures with these negative photoresists is fastidious and ...

Micromachining arbitrary 3D silicon structures for micro-electromechanical systems can be accomplished using gray-scale lithography along with dry anisotropic etching. In this study we have investigated two important design limitations for gray-scale lithography: the minimum usable pixel size and maximum usable pitch size. Together with the resolution of the projection lithography system and th...

This research attempted to fabricate a gas-diverting valve using LTCC technology for the emerging field of meso-scale devices. A photolithographic process for patterning Low Temperature Co-Fired Ceramic (LTCC) tapes utilizing DuPont Green Tape tape coupled with DuPont Riston 9015, a dry photoresist, is described in detail. Based on the device design, calculations determining the theoretical r...

The soft baking step of a photolithography process is analyzed theoretically, taking the effect of the temperature dependence of the diffusivity of solvent into account. A coordinates-transform technique is chosen to solve the moving boundary problem under consideration. The temporal variation of the thickness of a film is predicted, and the result obtained justified by fitting experimental dat...

This communication reports a new method to form multilevel features in a single layer of SU-8 photoresist to facilitate the generation of 3D microfluidic chips. The method utilizes the spatial dependence of diffracted light intensity to selectively overexpose masked regions of photoresist and requires only a UV light source and a single transparency mask. 3D structures are formed within microfl...

Resolution enhancement in far-field photolithography is demonstrated using a plasmonic metamask in the proximity regime, in which Fresnel diffraction is dominant. The transverse magnetic component of the diffracted wave from the photomask, which reduces the pattern visibility and lowers the resolution, was successfully controlled by coupling with the anti-symmetric mode of the excited surface p...