We present the design, fabrication and characterization of athermal nano-photonic silicon ring modulators. The athermalization method employs compensation of the silicon core thermo-optic contribution with that from the amorphous titanium dioxide (a-TiO(2)) overcladding with a negative thermo-optic coefficient. We developed a new CMOS-compatible fabrication process involving low temperature RF ...

Nanocrystalline zinc oxide thinfilms have been prepared on glass substrates at different temperatures through planar RF-magnetron sputtering. The particle size reduction with respect to substrate temperature has been studied with x-ray 144 K. Saravanakumar et al diffraction (XRD) and atomic force microscopy (AFM). Cross-sectional transmission electron microscopic (TEM) studies employing dark-fi...

We report the discovery of a face-centered cubic (Al1-xCrx)2O3 solid solution [0.60 preferred orientation and exhi...

The corrosion behavior of TiN coated 316L stainless steel in an artificial physiological solution was investigated by means of an electrochemical test. Two different PVD methods were used for film deposition: cathodic arc and reactive magnetron sputtering. The dependence of the corrosion resistance on the main deposition parameters (nitrogen pressure, substrate bias) was analyzed. For a better ...

This study fabricates p-type Ni1−xO:Li/n-Si heterojunction solar cells (P/n HJSCs) by using radio frequency (RF) magnetron sputtering and investigates the effect of substrate temperature on photovoltaic cell properties. Grazing incidence x-ray diffraction, four point probe, and ultraviolet-visible-near infrared discover the optoelectrical properties of p-Ni1-xO thin films. The results show that...

Abstract Lithium manganese oxide thin films have been deposited on nickel (Ni) and platinum (Pt) coated stainless steel substrates at room temperature using powder target by Radio Frequency (rf) reactive magnetron sputtering. The samples are exposed to heat treatment 500 °C form crystalline phase. Nickel film coatings carried out direct current (DC) X-ray diffraction (XRD), photoelectron spectr...

Titanium-boron-nitrogen (Ti-B-N) thin films were deposited by RF reactive magnetron sputtering using a titanium diboride (TiB2) target in an argon + nitrogen mixture. The mass flow rate was kept constant, whereas that of pulsed during the deposition. A constant pulsing period P = 10 s used, and introduction time gas (duty cycle (dc)) systematically varied from dc 0 to 100% period. This process ...

In this paper, we report on the electrical properties of metal–oxide–semiconductor (MOS) capacitors containing a well-confined 8 nm-thick SiGe amorphous layer (a-SiGe) embedded in a SiO2 matrix grown by RF magnetron sputtering at a low temperature (350 ◦C). Capacitance–voltage measurements show that the introduction of the SiGe layer leads to a significant enhancement of the charge trapping cap...