نتایج جستجو برای: sputter etching
تعداد نتایج: 18291 فیلتر نتایج به سال:
This report and the two preceding semiannual reports present the results of eighteen months of research aimed at demonstrating the viability of a mirror structure concept formed by sputter deposited materials. The mirror concept would be used in high energy CO, C0?, and other infrared laser systems at the infrared wave length of 10.6 m. Briefly, the mirror concept consisted of a support with se...
The use of metal-assisted HF chemical etching as a convenient technique to produce a few microns thick porous layer in silicon microchannels was demonstrated. Gas phase selective oxidation of rosalva to its aldehyde (costenal) was performed in glass/silicon microstructured reactors at temperatures of 375–475 °C on silver catalyst which was deposited on both porous and flat silicon surface by sp...
Imaging using time-of-flight secondary ion mass spectrometry (TOF-SIMS) with buckministerfullerene (C(60)) primary ions offers the possibility of mapping the chemical distribution of molecular species from biological surfaces. Here we demonstrate the capability of the technique to provide biomolecular information from the cell surface as well as from within the surface, as illustrated with the ...
Microtexturing of implant surfaces is of major relevance in the endeavor to improve biorelevant implant designs. In order to elucidate the role of biomaterial’s topography on cell physiology, obtaining quantitative correlations between cellular behavior and distinct microarchitectural properties is in great demand. Until now, the microscopically observed reorganization of the cytoskeleton on st...
In this paper we report on the fabrication of a close proximity shadow mask designed for sputtering into cavities or onto the back surface of freestanding silicon nitride (SiNx) membranes. Sputtering into a well-defined area on a fragile surface is difficult since sputter deposition through a shadow mask separated from the deposition surface typically results in spreading of the deposited mater...
Indium Tin Oxide (ITO) thin films are transparent conducting wide bandgap oxide. In this study investigated optical, structural and morphological properties of sputtered ITO thin films using X-ray diffraction spectroscopy (XRD), Scanning electron microscopy (SEM), Energy Dispersive Spectroscopy (EDX) and optical absorption techniques. These measurements revealed that the oxygen gas percentage p...
Thin-film growth by sputter deposition is a manufacturing process that is well suited for study by particle simulation methods. The authors report on the development of a high performance, parallel, molecular-dynamics software package that simulates atomic metal systems under sputter deposition conditions. The package combines advanced techniques for parallel molecular dynamics with specialized...
The metal-assisted chemical etching (MACE) was used to synthesis silicon nanowires. The effect of etchant concentration, etching and chemical plating time and doping density on silicon nanowires length were investigated. It is held that the increasing of HF and H2O2 concentrations lead to etching rate increment and formation of wire-like structure. The results show that, the appropriate ratio o...
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