We report the full characterization of a photocurable dimethacrylate-based formulation modified with small amounts (1 and 3 wt%) polystyrene-block-poly(ethylene oxide) (PS-b-PEO) block copolymer (BCP). The UV curable is mixture bisphenol A bis(2-hydroxy-3-methacryloxypropyl)ether (Bis-GMA) triethylene glycol dimethacrylate (TEGDMA) contains phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide (Irga...