نتایج جستجو برای: dc magnetron sputtering
تعداد نتایج: 63723 فیلتر نتایج به سال:
Diamond-like carbon (DLC) thin films used in this study were prepared with DC magnetron sputtering deposition. Silicon (100) wafers were used as the substrates onto which an RF bias was applied during the film deposition. For the nitrogen doped DLC films, a pure graphite target was used as the carbon source and nitrogen gas was introduced into the deposition chamber via a mass flow controller. ...
Pulsed-laser atom probe tomography of p-type field effect transistors on Si- on-insulator substrates
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16 Multilayered structures with 14 to 50 nm periods composed of titanium and two different 17 titanium oxides, TiO and TiO2, were accurately produced by DC magnetron sputtering 18 using the reactive gas pulsing process (RGPP). Structure and composition of these 19 periodic TiO2/TiO/Ti stacks were investigated by X-ray diffraction (XRD) and 20 transmission electronic microscope (TEM) techniques....
Low-temperature and low-pressure plasma was investigated by OES (optical emission spectroscopy) in the range 200–1100 nm. For displaying measured emission spectra and identification of spectrum lines the software Spectrum Analyzer was used. Two modes of glow discharge present in the DC cylindrical magnetron apparatus which were previously researched by a mass spectrometer were studied by OES. T...
A cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. The substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. The Al/ Cu multilayer film was deposited on the glass substrate at the following conditions: Working g...
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Titania and doped-titania coatings can be deposited by a wide range of techniques; this paper will concentrate on magnetron sputtering techniques, including "conventional" reactive co-sputtering from multiple metal targets and the recently introduced high power impulse magnetron sputtering (HiPIMS). The latter has been shown to deliver a relatively low thermal flux to the substrate, whilst stil...
Abstract Today gold is used as contact material on electric contacts for low current applications. Gold, however, has low wear resistance, is expensive and environmentally stressful to produce. An alternative contact material to gold is nano composite Ti-Si-C-Ag deposited with DC-magnetron sputtering. Nano composite Ti-Si-C-Ag has so far been deposited by a compound Ti-Si-C sputter target with ...
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