A novel non-lithographic technique for the fabrication of carbon nanotube thin film transistors is presented. The whole transistor fabrication process requires only one mask which is used both to pattern transistor channels based on aerosol synthesized carbon nanotubes and to deposit electrodes by metal evaporation at different angles. An important effect of electrodynamic focusing was utilized...

We report a high-performance graphene/Si field-effect transistor fabricated via rapid chemical vapor deposition. Oligolayered graphene with a large uniform surface acts as the local gate of the graphene transistors. The scaled transconductance, gm, of the graphene transistors exceeds 3 mS/μm, and the ratio of the current switch, Ion/Ioff, is up to 100. Moreover, the output properties of the gra...

Abstract Integrating ferroelectric negative capacitance (NC) into the field-effect transistor (FET) promises to break fundamental limits of power dissipation known as Boltzmann tyranny. However, realizing stable static in non-transient non-hysteretic regime remains a daunting task. The problem stems from lack understanding how origin NC due emergence domain state can be put use for implementing...

In this paper, a brief overview of TID effect in SOI technology is presented. The introduction of buried oxide(BOX) adds vulnerability to TID effect in SOI transistors because of its large thickness. Also the BOX introduces special charge traps, the delocalized spin centers, which in most cases are positive. The charge buildup in BOX could increase the leakage current in front gate transistor i...