نتایج جستجو برای: sputter etching

تعداد نتایج: 18291  

2014
R. W. Stewart

This report and the two preceding semiannual reports present the results of eighteen months of research aimed at demonstrating the viability of a mirror structure concept formed by sputter deposited materials. The mirror concept would be used in high energy CO, C0?, and other infrared laser systems at the infrared wave length of 10.6 m. Briefly, the mirror concept consisted of a support with se...

Journal: :Nippon Ganka Gakkai zasshi 1999
K Sasaki H Fukudome T Inoué

PURPOSE The basal surface of the corneal endothelium and the stromal and endothelial surfaces of Descement's membrane in rats were studied by scanning electron microscopy. METHODS We compared the fine structures of the two surfaces of Descemet's membrane both after sputter-coating with platinum and without sputter-coating. RESULTS Fine structures were made clearly visible without metal coat...

2007
K Zhang F Rotter M Uhrmacher C Ronning J Krauser H Hofsäss

We have investigated the correlation between nanoscale surface ripple patterns and the magnetic texture of polycrystalline iron and nickel thin films. The ripple patterns were created by ion beam sputter erosion of films evaporated on Si substrates with 5 keV Xe ions under grazing incidence and fluences between 1015 and 1017 cm−2. The as-deposited films with an rms roughness of about 1 nm are m...

2012
Jian Li

The recent development of Dual-BeamTM or Cross-BeamTM FIB systems has gradually taken over the traditional single beam FIB systems. A typical FIB column contains a liquid metal ion source that produces a finely focused Ga ion beam. The primary Ga ion beam is accelerated by 30-50 kV, and directed towards the features of interest on the specimen. The incident ion beam will sputter atoms from the ...

2008
M. Lattemann U. Helmersson

In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel high power impulse magnetron sputtering (HIPIMS) technique followed by reactive unbalanced d.c. magnetron sputtering deposition was performed using a Cr target. The HIPIMS plasma comprising a high metal ion-to-neutral ratio consisting of singleand doublecharged metal species identified by mass spe...

Journal: :journal of dental research, dental clinics, dental prospects 0
sogra yassaei reza fekrazad neda shahraki mahdjoube goldani moghadam

background and aims. the aim of this study was to compare shear bond strength (sbs) of metal and ceramic brackets bonded to enamel using acid versus er:yag laser etching. materials and methods. eighty premolars were divided into 4 groups: am (acid etching/ metal brackets), ac (acid etching/ ceramic brackets), lm (laser etching/ metal brackets) and lc (laser etching/ ceramic brackets). enamel co...

Introduction: Dental ceramics are considered as materials that can restore the appearance of natural teeth. Etching the inner surface of a ceramic restoration with hydrofluoric acid (HF) followed by using a silane coupling agent is a well-known and recommended method to increase the bond strength. The aim of etching on ceramic structure is to enhance the surface roughness (Ra) and energy and to...

1999
L. Schulz Paul Scherrer

The following paper outlines the working principles of sputter-ion pumps. The pumping mechanisms for reactive and inert gas species, as well as argon instability are explained. The operating pressure range, special designs for integrated linear pumps in accelerators and operational aspects are discussed.

Journal: :dental research journal 0
s. hamid raji reza birang fateme majdzade reza ghorbanipour

background: based on contradictory findings concerning the use of lasers for enamel etching, the purpose of this study was to investigate the shear bond strength of teeth prepared for bonding with er-yag laser etching and compare them with phosphoric acid etching. materials and methods: in this in vitro study forty – eight premolars, extracted for orthodontic purposes were randomly divided in t...

1999
P. B. Fischer S. Y. Chou

The ability to etch nanoscale features in Si is of great interest for trench isolation’ and trench capacitors2 in very large scale integrated circuits and for novel quantum effect Si devices. Another attractive aspect for nanoscale Si structures is to study possible light emission which has been observed in porous Si.3 Techniques such as wet chemical etching are not suitable for etching nanosca...

نمودار تعداد نتایج جستجو در هر سال

با کلیک روی نمودار نتایج را به سال انتشار فیلتر کنید