نتایج جستجو برای: antireflection coating

تعداد نتایج: 37529  

2016
J. Piekoszewski M. Gryziński J. Langner Z. Werner G. C. Huth

2014 The paper presents the first demonstration of a new method of forming photovoltaic p-n junction in silicon by the « Pulse Implantation Doping (PID) » technique. In this technique, an intense ion pulse provides both the dose necessary for doping and the portion of energy required to recrystallize a damage-free, doped surface layer. The ion beam pulses within the range of one microsecond and...

2012
Nesma Nafie Manel Abouda Lachiheb Mongi Bouaicha

Owing to their interesting electronic, mechanical, optical, and transport properties, silicon nanowires (SiNWs) have attracted much attention, giving opportunities to several potential applications in nanoscale electronic, optoelectronic devices, and silicon solar cells. For photovoltaic application, a superficial film of SiNWs could be used as an efficient antireflection coating. In this work ...

2013
R. S. Dubey

Porous Silicon (PS) has found its broad application for optoelectronics devices specially solar cells applications due to its efficient antireflection coating. This material has advantages such as broaden band gap, wide absorption spectrum and high optical transmission range from 700-1000nm. In this paper, the experimental study of electrochemically prepared porous silicon structures is present...

2016
P. L. Poole A. Krygier G. E. Cochran P. S. Foster G. G. Scott L. A. Wilson J. Bailey N. Bourgeois C. Hernandez-Gomez D. Neely P. P. Rajeev R. R. Freeman D. W. Schumacher

We describe the first demonstration of plasma mirrors made using freely suspended, ultra-thin films formed dynamically and in-situ. We also present novel particle-in-cell simulations that for the first time incorporate multiphoton ionization and dielectric models that are necessary for describing plasma mirrors. Dielectric plasma mirrors are a crucial component for high intensity laser applicat...

1999
R. R. Willey

Edge filters which block one spectral region and pass an adjacent region are normally constructed with periodic stacks of high and low index layers of equal quarter wave optical thickness at the center wavelength of the blocked band. A preliminary and a subsequent aperiodic structure of several layers which minimize the reflectance in the passband are usually needed to transition from the effec...

Journal: :Nano letters 2014
Emmett E Perl William E McMahon Robert M Farrell Steven P DenBaars James S Speck John E Bowers

Optical thin-film coatings are typically limited to designs where the refractive index varies in only a single dimension. However, additional control over the propagation of incoming light is possible by structuring the other two dimensions. In this work, we demonstrate a three-dimensional surface structured optical coating that combines the principles of thin-film optical design with bio-inspi...

2018
Yuguo Tao

This chapter aims to provide students/engineers/scientists in the field of photovoltaics with the basic information needed to understand the operating principles of screen‐ printed front junction n‐type silicon solar cells. The relevant device fabrication process‐ ing is described, from texturing, diffusion, passivation and antireflection coating, to screen‐ printed and fired‐through metallizat...

Journal: :Optics express 2016
Daniel A Goldman Joseph Murray Jeremy N Munday

We describe high efficiency thin-film InP solar cells that utilize a periodic array of TiO2 nanocylinders. These nanophotonic resonators are found to reduce the solar-weighted average reflectivity of an InP solar cell to ~1.3%, outperforming the best double-layer antireflection coatings. The coupling between Mie scattering resonances and thin-film interference effects accurately desc...

2005
Yang Zhao Guangzhao Mao Jinsong Wang

We report the first results of self-assembled nanostructures using colloids for antireflection optical coatings. Two-dimensional (2D) periodic nano-structures were made by using self-assembled 2D colloidal crystals on top of a transparent substrate. An atomic force microscope was used to evaluate the quality of the nanostructure. The feature size of the structures was around 105 nm. This sub-wa...

2002
Yeonsang Park Joong-Seon Choe Heonsu Jeon

We have designed and fabricated a double-layer antireflection (AR) film by selective oxidation of an epitaxially grown GaAs/AlAs heterostructure. The method presented in this work has the advantage that it is much simpler in processing than the conventional AR coating method. Furthermore, the fabrication steps for the AR films are fully compatible with the standard monolithic semiconductor devi...

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