نتایج جستجو برای: inductively coupled plasma
تعداد نتایج: 546406 فیلتر نتایج به سال:
Workers can be exposed to fume, arising from welding activities, which contain toxic metals and metalloids. Occupational hygienists need to assess and ultimately minimize such exposure risks. The monitoring of the concentration of particles in workplace air is one assessment approach whereby fume, from representative welding activities, is sampled onto a filter and returned to a laboratory for ...
nanomagnetic mgfe2o4 is an active, stable, and reusable catalyst for the oxidation of alcohols. the oxidation of various primary and secondary alcohols has been examined and related corresponding products were obtained in good yields. the reactions were carried out in the presence of water as solvent and oxone (at room temperature) or h2o2 (at 60 ºc) as an oxidant. the catalyst was investigated...
The samples from Xishanyao Formation in Gashunwusan Mine were analysed by inductively coupled plasma massspectrometry (ICP-MS), X-Ray fluorimetry (XRF) and other techniques. Through the use of the above techniques, we researched characteristics and modes of occurrence of the trace elements. According to content and ratios of trace elements, we discussed coalforming environments of the research ...
The dependence of analyte sensitivity and vaporization efficiency on the operating parameters of an inductively coupled plasma mass spectrometer (ICPMS) was investigated for a wide range of elements in aerosols, produced by laser ablation of silicate glass. The ion signals were recorded for different carrier gas flow rates at different plasma power for two different laser ablation systems and c...
Contamination of wafers by particles in plasma processing reactors is a continuing problem affecting yields of microelectronic devices. In this letter, we report on a computational study of particle contamination of wafers in a high plasma density inductively coupled plasma ~ICP! reactor. When operating with an unbiased substrate, particles readily contaminate the wafer due to high ion fluxes w...
Low pressure ~,10 mTorr! inductively coupled plasma sources are being developed for etching and deposition of semiconductors and metals. In models for these devices, plasma dynamics are typically coupled to the electromagnetic fields through Ohm’s law, which implies that collisional heating is the dominant power transfer mechanism. In this article, we describe an algorithm to couple plasma dyna...
Oligonucleotides containing a biotin functionality were successfully labelled with a streptavidin nanogold conjugate and subsequently separated and analysed by high performance liquid chromatography-inductively coupled plasma-mass spectrometry (HPLC-ICP-MS).
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