نتایج جستجو برای: physical vapor deposition

تعداد نتایج: 775081  

A. Ebrahimzad N. Parsafar,

Tellurium nanostructures have been prepared by physical vapor deposition method in a tube furnace. The experiments were carried out under argon gas flow at a pressure of 1 mbar. Tellurium powder was evaporated by heating at 350°C and 430°C and was condensed on substrates at 110–250°C, in the downstream of argon gas flow. The products were characterized by field emission scanning electron micros...

2015
K. H. A. Bogart N. F. Dalleska G. R. Bogart Ellen R. Fisher

Articles you may be interested in Investigation of SiO2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectroscopy Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry Determination of the mechanical stress in plasma enhanced ...

2017
Sumana Ghosh

Thermal barrier coatings (TBCs) provide effective thermal barrier to the components of gas turbine engines by allowing higher operating temperatures and reduced cool‐ ing requirements. Plasma spraying, electron-beam physical vapor deposition, and sol‐ ution precursor plasma spray techniques are generally used to apply the TBCs on the metallic substrates. The present article addresses the TBCs f...

2013
N. Dahbi

The effect of chemical treatment in CdCl2 on the compositional changes and defect structures of potentially useful ZnS solar cell thin films prepared by vacuum deposition method was studied using the complementary Rutherford backscattering (RBS) and Thermoluminesence (TL) techniques. A series of electron and hole traps are found in the various as deposited samples studied. After treatment, pert...

Journal: :JCIT 2008
Jürgen Geiser Robert Röhle

In this paper we present modeling and simulation for physical vapor deposition for metallic bipolar plates. In the models we discuss the application of different models to simulate the transport of chemical reactions of the gas species in the gas chamber. The so called sputter process is an extremely sensitive process to deposit thin layers to metallic plates. We have taken into account lower o...

2016
Subrina Rafique Lu Han Marko J. Tadjer Jaime A. Freitas Nadeemullah A. Mahadik Hongping Zhao Jaime A. Freitas

Journal: :Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2000

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