نتایج جستجو برای: plasma cvd

تعداد نتایج: 369460  

Journal: :International journal for vitamin and nutrition research. Internationale Zeitschrift fur Vitamin- und Ernahrungsforschung. Journal international de vitaminologie et de nutrition 2008
Kevin S Edgar Jayne V Woodside Paula Skidmore Christopher Cardwell Kathryn Farelll Michelle C McKinley Ian S Young Alexander S Whitehead K Fred Gey John W G Yarnell Alun Evans

OBJECTIVES Raised plasma homocysteine is a risk factor for cardiovascular disease (CVD). Cysteine has also been associated with CVD risk. In this study, we investigated the association between known CVD risk factors, dietary factors, and total plasma cysteine, cysteinyl-glycine, and homocysteine. METHODS The study group was 765 male workers aged between 30-49 years. The dietary habits of the ...

Journal: :Journal of the Surface Finishing Society of Japan 1996

Journal: :Journal of the Japan Society of Powder and Powder Metallurgy 1988

Journal: :Journal of the Japan Society of Powder and Powder Metallurgy 2012

Journal: :Cardiovascular Diabetology 2008
Hermione C Price Lynne Tucker Simon J Griffin Rury R Holman

BACKGROUND There is currently much interest in encouraging individuals to increase physical activity in order to reduce CVD risk. This study has been designed to determine if personalised CVD risk appreciation can increase physical activity in adults at high risk of CVD. METHODS/DESIGN In a 2 x 2 factorial design participants are allocated at random to a personalised 10-year CVD risk estimate...

Journal: :Journal of physics. Condensed matter : an Institute of Physics journal 2009
J E Butler Y A Mankelevich A Cheesman Jie Ma M N R Ashfold

In this paper we review and provide an overview to the understanding of the chemical vapor deposition (CVD) of diamond materials with a particular focus on the commonly used microwave plasma-activated chemical vapor deposition (MPCVD). The major topics covered are experimental measurements in situ to diamond CVD reactors, and MPCVD in particular, coupled with models of the gas phase chemical an...

2008
Hiroshi SATO Yuuki KAWASHIMA Masatoshi TANAKA Kazunori KOGA William M. NAKAMURA Masaharu SHIRATANI

We have studied dependence of volume fraction of clusters in a-Si:H films on deposition rate of the films using a multi-hollow discharge plasma CVD method The maximum deposition rate realized for each pressure exponentially increases from 0.014 nm/s to 0.96 nm/s with decreasing pressure from 1.0 Torr to 0.1 Torr, whereas the volume fraction of clusters slightly increases with increasing the dep...

Journal: :Journal of the Japan Institute of Metals and Materials 1996

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