نتایج جستجو برای: si1

تعداد نتایج: 1017  

Journal: :Journal of medicinal chemistry 1963
A KALIR S SZARA

fall in stimulant activity. \T7hile SI1 inliihits t l i c stiinulaiit response to serotonin 011 tlic iso1:tted rat fundus strip, the 2-aminopropyl cwiipountl SI I 1 produced powerful contractions of t,lic same tissue. ‘l’lic piwetice of a 5-amino group arid the sidc cliairi i l l the %-position characterize the compounds of (Group I ) L\ Iiicli diow very w a k antagonism towards serotonin, liib...

2012
James T. Teherani Winston Chern Dimitri A. Antoniadis Judy L. Hoyt Liliana Ruiz Christian D. Poweleit José Menéndez

Metal-oxide-semiconductor capacitors were fabricated on type-II staggered gap strained-Si/strained-Ge heterostructures epitaxially grown on relaxed SiGe substrates of various Ge fractions. Quasistatic quantummechanical capacitance-voltage (CV) simulations were fit to experimental CV measurements to extract the band alignment of the strained layers. The valence-band offset of the strained-Si/str...

2018
Richard Daubriac Emmanuel Scheid R. Daubriac E. Scheid S. Joblot R. Beneyton P. Acosta Alba S. Kerdilès F. Cristiano

The reduction of the contact resistance RC is one of the most challenging issues related to the miniaturisation of advanced MOSFET architectures, including FDSOI technology (Fully Depleted Silicon-OnInsulator). RC strongly depends on the active dopant concentration at the semiconductor/salicide interface. It is therefore essential that electrical activation at different depths within a doped la...

2010
Weiwei Zheng Kun Yao Keith Chung Sushobhan Avasthi

A process for the growth of uniform boron-doped Si/SiGe multiple quantum wells by rapid thermal chemical vapor deposition (RTCVD) for studying intersubband transitions for quantum cascade laser applications has been developed. The doping density profiles are extremely sharp (~2 nm/decade and ~3 nm/decade for the leading and trailing boron edges, respectively) measured by high resolution seconda...

2005
RICHARD E. GARDNER

r omovals hlave been rel)o ted. This report adds two al(litional (ases, both With unu11sualal featullres'. In the first (ase thel)atielit underwent successful removal of a inylxoina by a closed method following accidental (lislodcgmenit of the tumnor dlurinig exp)loratioli of the mitral valvc. This is the second reported com)lete removal of si1('h a tumor without the aid of extracorporeal circu...

Journal: : 2022

The present paper is devoted to the comparison of determination methods optical pseudogap values Ag7(Si1-xGex)S5I (x = 0, 0.2, 0.4, 0.6, 0.8, 1.0) solid solutions by means two spectroscopy techniques: absorption and diffuse reflection. Optical was performed on thin single crystalline plane-parallel samples. Diffuse reflectance spectra were obtained samples in form microcrystalline powders (~ 10...

Journal: :Journal of Applied Physics 2022

Measurements of the dark conductivity and thermoelectric power in hydrogenated amorphous silicon–germanium alloys (a-Si1-xGex:H) reveal that charge transport is not well described by an Arrhenius expression. For with concentrations Ge below 20%, anomalous hopping observed a power-law exponent 3/4, while temperature dependence higher best fit combination dependence. The latter has been attribute...

2005
RICHARD E. GARDNER

r omovals hlave been rel)o ted. This report adds two al(litional (ases, both With unu11sualal featullres'. In the first (ase thel)atielit underwent successful removal of a inylxoina by a closed method following accidental (lislodcgmenit of the tumnor dlurinig exp)loratioli of the mitral valvc. This is the second reported com)lete removal of si1('h a tumor without the aid of extracorporeal circu...

2013
Sushobhan Avasthi William E. McClain Gabriel Man Antoine Kahn Jeffrey Schwartz James C. Sturm

In contrast to the numerous reports on narrow-bandgap heterojunctions on silicon, such as strained Si1 xGex on silicon, there have been very few accounts of wide-bandgap semiconducting heterojunctions on silicon. Here, we present a wide-bandgap heterojunction—between titanium oxide and crystalline silicon—where the titanium oxide is deposited via a metal-organic chemical vapor deposition proces...

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