We have developed a novel wafer-scale single-crystalline silicon micromirror bonding process to fabricate optically flat micromirrors on polysilicon surface-micromachined 2D scanners. The electrostatically actuated 2D scanner has a mirror area of 450 jtm x 450 tm and an optical scan angle of Compared to micromirrors made with a standard polysilicon surface-micromachining process, the radius of ...

Separation by implanted oxygen (SIMOX) material has proven to provide an extended temperature range (up to 500°C) of operation for partially depleted silicon-on-insulator (SOI) test structures and product circuits in both transportation and communication applications. Such high temperature use is possible due to the built-in dielectric isolation which eliminates the isolation junction and its a...

Microring resonator devices implemented on silicon and silicon-on-insulator substrates have a unique potential to be used in high-bandwidth multiplewavelength integrated photonic networks. A scheme for the wavelength allocation is proposed, and its feasibility is verified experimentally. The important system-level trade-offs that result from the proposed scheme, including those among bandwidth,...

We present an efficient, fully quantum mechanical approach to calculating ballistic transport in fully-depleted silicon-on-insulator metal-oxide semiconductor field effect transistor devices in three dimensions and apply the technique to the calculation of threshold voltages for realistic devices with narrow channels. We illustrate the fact that each dopant configuration becomes exceedingly imp...

An overview of the current state of the art in scanning micromirror technology for switching, imaging, and beam steering applications is presented. The requirements that drive the design and fabrication technology are covered. Electrostatic, electromagnetic, and magnetic actuation techniques are discussed as well as the motivation toward combdrive configurations from parallel plate configuratio...

A novel dynamical slow light cell with a tunable group delay, fabricated in silicon-on-insulator, is demonstrated. It provides a tuning range of more than 1 ns, with a usable group delay of about 0-24 ps. ©2010 Optical Society of America OCIS codes: (130.3120) Integrated optics devices; (200.4490) Optical buffers; (230.5750) Resonators.

We report on the backscattering induced by sidewall roughness in silicon on insulator optical nanowires, its dependence on the waveguide geometrical and optical parameters and its impact on silicon photonic devices. In silicon ring resonators cavity-enhanced backscattering, increasing with the square of the resonator’s finesse, emerges as a severe

The standard platform for silicon photonics has been ridge or channel waveguides fabricated on silicon-on-insulator (SOI) wafers. SOI waveguides are so versatile and the technology built around it is so mature and popular that silicon photonics is almost regarded as synonymous with SOI photonics. However, due to several shortcomings of SOI photonics, novel platforms have been recently emerging....

We report on an implementation of a self-powered radio-frequency identification tag in a three-dimensional silicon on insulator (3D SOI) process, which uses backscatter modulation to send a hardwired digital code to a scanner.

An integrated optical millimetre-wave signal generator based on a coupled microring resonator, which doubles the frequency of the electrical signal driving a phase modulator, is proposed and experimentally demonstrated for future radio-over-fibre systems. The coupled microring notch filter was fabricated on a silicon-on-insulator wafer. A high extinction ratio optical millimetre-wave signal was...