Atomic Layer Deposition (ALD) is a promising technique for growing ultrathin, pristine dielectrics on metal substrates, which is essential to many electronic devices. Tunnel junctions are an excellent example which require a leak-free, ultrathin dielectric tunnel barrier of typical thickness around 1 nm between two metal electrodes. A challenge in the development of ultrathin dielectric tunnel ...

This article describes the development of an integrated physical model for the rf diode sputtering of metal thin films. The model consists of: ~1! a computational fluid dynamic finite element model for the velocity and pressure distribution of the working gas Ar flow in the chamber, ~2! a steady-state plasma model for the flux and energy of Ar ions striking the target and the substrate, ~3! a m...

The influence of the ion–atom potential on sputtering parameters calculated with molecular dynamics simulations was last investigated in detail by Harrison in 1980 [J. Appl. Phys. 52 (1981) 1499]. Harrison concluded that except for total yields, layer yields, yields from different crystal orientations and atom per single ion (ASI) distributions, most sputtering properties were relatively insens...

The writer, in sputtering a large number of mirrors, has found that the apparatus and methods to be described have several advantages, particularly where very large and perfect mirrors are desired. The accompanying diagram will be self explanatory, and the dimensions given have been found convenient for mirrors up to 10 cm diameter. The apparatus has been designed to avoid the use of any grease...

Sputtering is an important physical vapor deposition (PVD) method in the manufacture of many products. However, sputtering processes are prone to arcing, which can cause damage to the work piece. Therefore, arcs must be detected and extinguished in a timely manner to minimize damage. Instantaneous arc rate and total arcs per process step are useful data for assessing PVD chamber health, and det...

The authors describe a method to produce gold nanoparticle-dispersed liquid crystals by means of sputtering, and discuss how the presence of gold nanoparticles affect the electro-optic response of the host liquid crystal. The method exploits the fact that liquid crystals possess low vapor pressures which allow them to undergo the sputtering process, and the target material is sputtered directly...

The erosion of frozen SO 2 due to bombardment by both light and heavy ions (He and F) was measured for bombarding energies of 0.08 to 1.3 MeV/amu. The number of SOp molecules ejected from the target per incident ion (i.e.• the sputtering yield) was 50 for 1.5 MeV He ions and ?300 for 6 MeV F ions. Ion bombardment followed by heating produced an oxygen/sulfur residue which was much more stable a...

The absolute sputtering yields of D+, He+and r.r on solid, liquid lithium and liquid tinlithium have been successfully measured and modeled at low energies in the Ion-surface InterAction Experiment (IIAX). IIAX is used in this work to determine the dependence of Li erosion on the use of hydrogen isotopes to treat liquid metal surfaces of both liquid lithium and liquid tin-lithium. Earlier data ...

We study the motion of dust grains into the Intergalactic Medium (IGM) around redshift z = 3, to test the hypothesis that grains can efficiently pollute the gas with metals through sputtering. We use the results available in the literature for radiation-driven dust ejection from galaxies as initial conditions, and follow the motion onward. Via this mechanism, grains are ejected into the IGM wit...

The corrosion resistant coatings used conventionally are susceptible to degradation, leading to pitting corrosion. This report summarizes the corrosion resistant nature of thin films of Cu-TiO2 coated on mild steel, in different corrosion environments. Nano meter thick (100nm, 125nm, 150nm) composite coatings were coated on steel substrate by RF magnetron sputtering technique. The required targ...