Abstract: In this paper, a DRIE process for fabricating MEMS silicon trenches with a depth of more than 250 m is described. The DRIE was produced in oxygen-added sulfur hexafluoride (SF6) plasma, with sample cooling to cryogenic temperature using a Plasmalab System 100 ICP 180 at different RF powers. A series of experiments were performed to determine the etch rate and selectivity of the some m...

In this paper using the Clifford algebra over R4 and its matrix representation, we construct Clifford scaling functions and Clifford wavelets. Then we compute related mask functions and filters, which arise in many applications such as quantum mechanics.

The mathematical problem discussed is important for generating test cases in order to debug floating point adders designs. Floating point numbers are assumed to be written as strings of {0, 1} bits, in a format compatible with IEEE standard 754. A mask is a string of characters, composed of {′0′,′ 1′,′ x′}. A number and a mask are compatible if they have the same length and each numerical chara...

background: increasedlife expectancy in populations has brought along specific new scenarios in the fields of medicine for the elderly; prevalence of physical complications such as edentulism and patients with dentures is growing. management of anesthesia and ventilation in this group of patients has turned into a great challenge. some researchers suggest dentures to be left in place during bag...

Anisotropic wet-chemical etching of silicon in alkaline solutions is a key technology in the fabrication of sensors and actuators. In this technology, etching through masks is used for fast and reproducible shaping of micromechanical structures. The etch rates RMhklN depend mainly on composition and temperature of the etchant. In a plot of etch rate versus orientation, there is always a deep, c...

This paper analyzes the synthesis of arbitrarily shaped optical pulses by spectral filtering in a fiber-and-grating pulse compressor. Spectral filtering of phase and amplitude is achieved by masking the spatially dispersed frequency components within the compressor. We show that the spectral filter is the convolution of the mask with the beam’s transverse intensity profile. We discuss the effec...

Inverse lithography attempts to synthesize the input mask which leads to the desired output wafer pattern by inverting the forward model from mask to wafer. In this article, we extend our earlier framework for image prewarping to solve the mask design problem for coherent, incoherent, and partially coherent imaging systems. We also discuss the synthesis of three variants of phase shift masks (P...

Mammogram registration can help avoid biopsies and help follow-up analysis. Mammogram registration is a challenge because of the compressibility of the breast tissue. We used the CIRS breast phantom image to study the registration methodology. The phantom images were acquired in Fused Full Field Digital Mammogram and Ultrasound (FFDMUS) framework. The acquired images were registered using our p...

Inverse lithography attempts to synthesize the input mask which leads to the desired output wafer pattern by inverting the forward model from mask to wafer. In this article, we extend our earlier framework for image prewarping to solve the mask design problem for coherent, incoherent, and partially coherent imaging systems. We also discuss the synthesis of three variants of phase shift masks (P...

A novel method for generating coded mask patterns based on Gaussian random fields (GRF) is proposed. In contrast to traditional algorithms based on cyclic difference sets, it is possible to construct mask patterns that encode a predefined point spread function (PSF). The viability of this approach and the reproducibility of the PSFs is examined, together with studies on the mean transparency, p...