A micromachined test structure was used to measure the etch rate of silicon in potassium hydroxide (KOH) as a function of surface orientation, which quantifies etchant anisotropy. By adding multidentate ligands, containing hydroxyl groups, to etchant solutions, the effects of these ligands on etch rate were determined. Bidentate ligands 1,2-ethanediol, 1,3-propanediol, and 1,4-butanediol each s...