The adsorption of AlCl3 on Si(100) and the effect annealing AlCl3-dosed substrate were studied to reveal key surface processes for development atomic-precision, acceptor-doping techniques. This investigation was performed via scanning tunneling microscopy (STM), X-ray photoelectron spectroscopy (XPS), density functional theory (DFT) calculations. At room temperature, readily adsorbed Si dimers ...
