نتایج جستجو برای: cold argon plasma

تعداد نتایج: 461086  

2016
S Corde E Adli J M Allen W An C I Clarke B Clausse C E Clayton J P Delahaye J Frederico S Gessner S Z Green M J Hogan C Joshi M Litos W Lu K A Marsh W B Mori N Vafaei-Najafabadi D Walz V Yakimenko

Plasma accelerators driven by particle beams are a very promising future accelerator technology as they can sustain high accelerating fields over long distances with high energy efficiency. They rely on the excitation of a plasma wave in the wake of a drive beam. To generate the plasma, a neutral gas can be field-ionized by the head of the drive beam, in which case the distance of acceleration ...

2002
K. L. Kelly J. E. Scharer E. S. Paller G. Ding

The feasibility of using a photoionized, low-ionization potential organic seed gas to initiate a high pressure plasma discharge is examined and compared to radio frequency breakdown of high pressure argon alone. The seed gas, tetrakis~dimethylamino!ethylene, which has an ionization potential of 6.1 eV is ionized by an ultraviolet laser through 6.4 eV photon absorption, and forms a plasma column...

Fig (Ficus carica L.) is a perishable fruit and it needs to use new techniques in order to increase shelf life of this product. In present study, atmospheric cold plasma as a non-thermal treatment was utilized for preserving fresh fig quality. Dielectric barrier discharge plasma was applied to fruits in two steps. Durations of first treatments were 1 and 5 minutes. Based on this step results, m...

1997
William C. Moss Douglas B. Clarke David A. Young

A sonoluminescing bubble has been modeled as a thermally conducting, partially ionized, two-component plasma. The model shows that the measured picosecond pulse widths are due to electron conduction and the rapidly changing opacity of the plasma and that these mechanisms are also responsible for the absence of an “afterglow” subsequent to the sonoluminescence flash while the hot bubble expands ...

2015
S. J. Cho J. W. Roberts I. Guiney X. Li G. Ternent K. Floros P. R. Chalker I. G. Thayne

The impact of subjecting a n-GaN surface to an in-situ argon plasma in an atomic layer deposition (ALD) tool immediately before deposition of an Al2O3 dielectric film is assessed by frequency dependent evaluation of Al2O3/GaN MOSCAPs. In comparison with a control with no pre-treatment, the use of a 50W argon plasma for 5 min reduced hysteresis from 0.25 V to 0.07 V, frequency dispersion from 0....

Journal: :Журнал Экспериментальной и Теоретической Физики 2014

Journal: :Revista espanola de enfermedades digestivas : organo oficial de la Sociedad Espanola de Patologia Digestiva 2009
S Rodríguez Muñoz

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