In this work, the titanium nitride (TiN) thin films were prepared on Si-wafers by using DC reactive magnetron sputtering from a pure target. The influence of N2 flow rates, in range 1.0-4.0 sccm, as-deposited TiN film’s structure was characterized several techniques. (i) crystal structures studied GI-XRD. (ii) thicknesses, microstructures, and surface morphologies analyzed FE-SEM. (iii) element...

using c2h2, 112 and as gases at 550'c, carbon nanotubes were fabricated on the surfaces of twosubstrates coated by nano thin layers of metal catalysts by dc magnetron sputtering. aystamless steel andfe/cteal, by thermal chemical vapor deposition (tcvd) the surface properties of the substrates wereparticularly investigated, and the effect of treatment of the substrates on the cnt's growth is cri...

nanostructures of noble metal materials have been used in organic solar cells for enhancement of performance and light trapping. in this study, we have introduced branched silver cauliflower-like nanopatterns as sub-wavelength structured metal grating in organic solar cells. self-assembled fabrication process of branched nanopatterns was carried out on a bio-template of cicada wing nanonipple a...

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...