This paper experimentally investigated the fabrication and optimization of micro-scale gratings formed by nanosecond laser etching. The mechanism of nanosecond laser processing and the geometric phase analysis (GPA) are discussed, and the factors influencing the fabrication process including laser energy, laser fluence, and ablation threshold of material, are experimentally studied. In order to...

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A new fabrication method is proposed to produce nanostructures on monocrystalline silicon based on the friction-induced selective etching of its Si3N4 mask. With low-pressure chemical vapor deposition (LPCVD) Si3N4 film as etching mask on Si(100) surface, the fabrication can be realized by nanoscratching on the Si3N4 mask and post-etching in hydrofluoric acid (HF) and potassium hydroxide (KOH) ...

Device encapsulation and packaging often constitutes a substantial part of the fabrication cost of micro electro-mechanical systems (MEMS) transducers and imaging sensor devices. In this paper, we propose a simple and cost-effective wafer-level capping method that utilizes a limited number of highly standardized process steps as well as low-cost materials. The proposed capping process is based ...

Femtosecond laser micromachining has emerged in recent years as a new technique for micro/nano structure fabrication because of its applicability to virtually all kinds of materials in an easy one-step process that is scalable. In the past, much research on femtosecond laser micromachining was carried out to understand the complex ablation mechanism, whereas recent works are mostly concerned wi...