نتایج جستجو برای: jet electro polishing
تعداد نتایج: 61497 فیلتر نتایج به سال:
The microfluid jet polishing (MFJP) process is a manufacturing technology in which small abrasive particles (such as diamond, alumina, and ceria) are premixed with carrier fluid (typically water) to form liquid suspension that pressurized expelled through nozzle for material removal. resulting microjet beam—with typical exit diameter the range from 0.1 1.0 mm—impinges workpiece surface removal ...
Additive manufacturing (AM) techniques have been rapidly expanding due to their ability produce complex geometries with an efficient material use. However one of the main drawback AM technologies is poor surface quality especially for what concerns powder based techniques. In order design reliable parts, mechanical properties resulting from process need be properly characterized. The present st...
This investigation is aimed at analysing linear instability of an initial stable jet through the air-sealed electro-centrifugal spinning process which significant in creating nanofibers. Utilising perturbation theory to diminish governing equations, into a 1-D mode with option solving acquired non-linear differential equations. Hence, trajectory power-law fluid during power has been determined....
Aim: To compare the effect of four different polishing systems on color stability of two Nano composite resins immersed in four beverages (Coffee, Tea, Cola and Fanta). Methods: Eighty disc shaped specimens of 10 mm diameter and 2 mm thickness were prepared for each of the two Nano composite resins (Tetric N Ceram; Estelite alpha). The specimens of each material were divided into four groups (n...
The increasing demands for lightweight design in the transport industry have led to an extensive use of materials such as aluminium alloys. forming sheets however presents significant challenges due low formability and increased susceptibility galling. tailored workpieces controlled die roughness surfaces are common strategies improve tribological behaviour, whilst galling is still not well und...
Problem statement: Abrasive is one of key influencing factors on the polished surface quality in Chemical Mechanical Polishing (CMP). Solid abrasives in CMP slurries are easy to cause polishing scratches. It is well known that reducing the hardness of abrasives would improve the polished surface quality. Therefore, the change in structure or shape of the abrasives means a change in polished sur...
Nanocrystalline diamond (NCD) thin films grown by chemical vapour deposition have an intrinsic surface roughness, which hinders the development and performance of the films' various applications. Traditional methods of diamond polishing are not effective on NCD thin films. Films either shatter due to the combination of wafer bow and high mechanical pressures or produce uneven surfaces, which ha...
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