Proliferation of data caused by rapid increases in computer power and the rise of the internet have caused an acute need for advanced data storage technology. Patterned magnetic media and magneto-resistive random-access memory (MRAM) can potentially fulfill this need. The technique of interference lithography is examined in the context of patterning ~100 nm size features. An interferometer is d...

I propose a quantum imaging method that can beat the Rayleigh-Abbe diffraction limit and achieve de Broglie resolution without requiring a multiphoton absorber or coincidence detection. Using the same nonclassical states of light as those for quantum lithography, the proposed method requires only optical intensity measurements, followed by image postprocessing, to produce the same complex quant...

To reduce critical dimension (CD) variation due to multiple interference effect, anti-reflective coatingl) and over coating processes2) have been proposed and investigated. In this paper, we discuss the problem of the over coating processes and report a new and simple process, called OCT (Optical-path Control Technique), for reducing the multiple interference effect that does not require new ma...

Specific configurations of four linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting the symmetries inherent in all 14 Bravais lattices. We present (1) the range of possible absolute contrasts, (2) the conditions for unity absolute contrast, and (3) the types of interference patterns possible for configurations of f...

A 1x3 beam splitter using multi-mode interference based on self-imaging is demonstrated theoretically and experimentally in PhCWs. The total transmission of the 1x3 splitter is almost equal to the corresponding length of W1 PhCW. The input power is distributed equally between the output ports within 1dB from 1541nm to 1552nm. KeywordsSplitter; Self-imaging; multi-mode interference; Photonic Cry...

The authors present a large-area spatial-frequency multiplication fabrication process for patterning one-dimensional periodic structures using multilevel interference lithography. In this process, multiple grating levels with different phase offsets are overlaid by aligning to a reference grating. Each grating level is pattern transfered into a single hard mask layer, effectively reducing the g...

Controlling plasmon-exciton coupling through band gap engineering of plasmonic crystals is demonstrated in the Kretschmann configuration. When the flat metal surface is textured with a sinusoidal grating only in one direction, using laser interference lithography, it exhibits a plasmonic band gap because of the Bragg scattering of surface plasmon polaritons on the plasmonic crystals. The contra...

Pulsed UV laser machining is an established method for production of 2.5D and 3D features in a wide variety of materials. In addition to direct laser patterning by ablation, exposure of photoresist using pulsed lasers can eliminate the need for large area contact photomasks. Half-tone machining, either by ablation or exposure, allows the production of high quality shallow features where the sur...