By using Radio Frequency (RF) magnetron sputtering method, Pb(Zr0.5Ti0.5)O3 (PZT) thin films were deposited on Pt/Ti/ SiO2/Si substrates. Pt/Ti bottom electrode was fabricated on SiO2/Si substrates by magnetron dual-facing-target sputtering system. Phase and crystalline structure analyses of the PZT films were performed on an X-ray diffraction(XRD), Surface morphology, roughness and particle si...

In 2004 we reported on a new evaporation set up for uranium-compound targets, basically UF4, for heavy-ion experiments [1]. Since for most experiments in nuclear physics and chemistry targets from metallic uranium would be preferred because side reactions are minimized, we upgraded our high-vacuum coater TF 600 from BOC Edwards© with a magnetron sputtering equipment which is suitable for deposi...

In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel high power impulse magnetron sputtering (HIPIMS) technique followed by reactive unbalanced d.c. magnetron sputtering deposition was performed using a Cr target. The HIPIMS plasma comprising a high metal ion-to-neutral ratio consisting of singleand doublecharged metal species identified by mass spe...

Modern applications of refractory ceramic thin films, predominantly as wear-protective coatings on cutting tools and on components utilized in automotive engines, require a combination of excellent mechanical properties, thermal stability and oxidation resistance. Conventional design approaches for transition metal nitride coatings with improved thermal and chemical stability are based on alloy...

Low-pressure plasmas offer a unique possibility of confinement, control, and fine tailoring of particle properties. Hence, dusty plasmas have grown into a vast field, and new applications of plasma-processed dust particles are emerging. During the deposition of thin amorphous films onto melamine formaldehyde (MF) microparticles in a C2H2 plasma, the generation of nanosized carbon particles was ...

A new D023 metastable phase of Cu3Au is found to grow at the interfaces of Au/Cu multilayers deposited by magnetron sputtering. The extent of formation of this novel alloy phase depends upon an optimal range of interfacial width primarily governed by the deposition wattage of the dc-magnetron used. Such interfacially confined growth is utilized to grow a ∼ 300 nm thick Au/Cu multilayer with thi...

This contribution sheds light on the role of crystal size and phase composition in inducing biomimetic apatite growth on the surface of nanostructured titania films synthesized by reactive magnetron sputtering of Ti targets in Ar+O(2) plasmas. Unlike most existing techniques, this method enables one to deposit highly crystalline titania films with a wide range of phase composition and nanocryst...

In this work, we employed classical molecular dynamics simulations model to study ZrxCu100-x (3 ≤ x ≤ 95) metallic glass films deposited on a silicon (100) substrate. Input data were chosen to fit with the experimental operating conditions of a magnetron sputtering deposition system. The growth evolution is monitored with variable compositions of the incoming atom vapor. The Zr-Zr, Cu-Cu and Zr...

Optical constants and roughness study of dc magnetron sputtered iridium films" (2002). Faculty Publications from the Department of Electrical and Computer Engineering. 5. Extremely smooth thin films of iridium have been deposited onto superpolished fused silica substrates using dc magnetron sputtering in an argon plasma. The influence of deposition process parameters on film microroughness has ...