0168-583X/$ see front matter 2011 Elsevier B.V. doi:10.1016/j.nimb.2010.12.026 ⇑ Corresponding author. Fax: +48 12 633 7086. E-mail address: [email protected] (B Molecular dynamics computer simulations have been used to investigate the effect of the cluster size on the sputtering yield dependence on the impact angle. Ar366 and Ar2953 cluster projectiles with 14.75 keV of incident ...

5 Abstract Data obtained from the exploration of the outer solar system has led to a 6 new area of physics: electronically induced sputtering of low-temperature, 7 condensed-gas solids, here referred to as ices. Icy bodies in the outer solar system 8 are bombarded by relatively intense fluxes of ions and electrons, as well as the 9 background solar UV flux, causing changes in their optical refl...

The bioactivity of hydroxyapatite (HA) coatings can be modified by the addition of different ions, such as silicon (Si), lithium (Li), magnesium (Mg), zinc (Zn) or strontium (Sr) into the HA lattice. Of the ions listed here, strontium substituted hydroxyapatite (SrHA) coatings have received a lot of interest recently as Sr has been shown to promote osteoblast proliferation and differentiation, ...

We report on the tuning of the Kondo effect in thin Au films containing a monolayer of cobalt(II) terpyridine complexes by altering the ligand structure around the Co(2+) ions by depositing a thin Au capping layer on top of the monolayer on Au by magnetron sputtering (more energetic) and e-beam evaporation (softer). We show that the Kondo effect is slightly enhanced with respect to that of the ...

Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and the surface to be etched. Also, the momentum transfer of an incoming ion can cause direct removal of the material to be etched, which is undesir...

We studied the effects of 100 keV proton irradiation on films of ammonia-water mixtures between 20 and 120 K. Irradiation destroys ammonia, leading to the formation and trapping of H(2), N(2), NO, and N(2)O, the formation of cavities containing radiolytic gases, and ejection of molecules by sputtering. Using infrared spectroscopy, we show that at all temperatures the destruction of ammonia is s...

Plasma sputtering is one of the most promising methods for reducing the amount of platinum catalyst in porous electrodes for low temperature fuel cells. Here, a simulation of the platinum deposition by radio frequency plasma sputtering has been developed and compared with experimental results to allow optimization of the deposition process. In the simulation, the transport of sputtered atoms th...

Dopant depth profiling and dose determination are essential for ultrashallow junction technology development. However they pose a challenge to the widely used dynamic secondary ion mass spectroscopy SIMS technique that suffers uncertainties due to an initial transient width comparable to the dopant depth distribution. In this work the authors report on the application of grazing incidence x-ray...